Decorative product including plasmon film and method of manufacturing the same
A technology of plasma membrane and manufacturing method, which is applied in decorative arts, special decorative structures, nano-structure manufacturing, etc., can solve the problem of inability to produce color bright films for customers
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Embodiment 1
[0041] figure 1 The plasma decoration E1 shown in (a) (b) is constituted by including the transparent substrate 10 , the first dielectric layer 20 , the metal nanoparticle layer 30 , the second dielectric layer 40 , and the reflective layer 50 shown below. constitute.
[0042] The transparent substrate 10 is a transparent and mirror-finished substrate made of glass, polycarbonate (PC), polymethyl methacrylate (PMMA), or the like.
[0043] The first dielectric layer 20 is disposed on the back of the transparent substrate 10 . The first dielectric layer 20 is made of SiO polymer (SiO X ) layer, with dielectric, light transmittance and water repellency. The water contact angle of the first dielectric layer 20 is 100°.
[0044] The metal nanoparticle layer 30 is a layer in which silver nanoparticles 31 , 31 . . . adhere to the back surface of the water-repellent layer 20 , and has conductivity (high conductivity). In addition, the metal nanoparticle layer 30 constitutes a pla...
Embodiment 2
[0059] figure 2 The plasma decoration E2 shown in (a) and (b) of the present embodiment 2 is different from the plasma decoration E1 of the embodiment 1 in that the film thickness of the metal nanoparticle layer 30 and the film formation time are not 5 Seconds instead of 7 seconds, the other is the same.
[0060] In addition, in order to objectively judge the characteristics of the plasma decoration E2 of Example 2, the following figure 2 The plasmonic decoration C2 of Comparative Example 2 shown in (c) and (d). The difference between the plasma decoration C2 of the comparative example 2 and the plasma decoration E2 of the embodiment 2 is that the first dielectric layer 20 is not made of SiO polymer but is made of SiO 2 composition, the water contact angle of the first dielectric layer 20 is not 100° but 14°, and its film-forming method (same as Comparative Example 1), and others are the same.
[0061] The plasma decoration E2 of Example 2 was compared with the plasma dec...
Embodiment 3
[0063] The plasma decoration E3 shown in Figure 3(a)(b) is different from the plasma decoration E1 of Example 1 in the film thickness of the metal nanoparticle layer 30 and the film formation time. Not 5 seconds but 15 seconds, other things being the same.
[0064] In addition, in order to objectively judge the characteristics of the plasma decoration E3 of the embodiment 3, such as image 3 The plasmonic decoration C3 of Comparative Example 3 shown in (c) and (d). The difference between the plasma decoration C3 of the comparative example 3 and the plasma decoration E3 of the embodiment 3 is that the first dielectric layer 20 is not made of SiO polymer but is made of SiO 2 composition, the water contact angle of the first dielectric layer 20 is not 100° but 14°, and its film-forming method (same as Comparative Example 1), and others are the same.
[0065] The plasma decoration E3 of Example 3 was compared with the plasma decoration C3 of Comparative Example 3, and the result...
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