The invention discloses an electrical inductance in an integrated circuit and a manufacturing method, comprising the following steps: 1, a metal layer is deposited on a dielectric layer; 2, the diagram of the electrical inductance is defined through adopting photoetching technology; 3, the etching is conducted on the metal layer, and the optical resist is removed, and a metal coil is formed; 4, the dielectric layer continues to be deposited, and a through hole is formed at the dielectric layer; 5, the filling metal is filled in the through hole; 6, step 1-step 5 are repeated to increase the number of layers of the electrical inductance, until the last layer of metal coil is formed. The electrical inductance in the integrated circuit contains a plurality of layers of metal coils in parallel, and the adjacent metal coils are connected through connecting contact holes. The electrical inductance of the integrated circuit which is manufactured through utilizing the manufacturing method of the invention comprises the plurality of metal coils, and increases the magnetic-field strength of the electrical inductance.