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γ-ray source based on all-optical laser plasma accelerator

A laser plasma and gamma ray source technology, applied in radioactive sources, nuclear engineering, etc., can solve problems such as limiting the application range of gamma ray sources, expensive electron accelerators, and bulky volume, and achieve simple operation, low cost, and good performance Effect

Inactive Publication Date: 2018-03-23
SHANGHAI JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Traditional electron accelerators are expensive and bulky, which limits the scope of application of this gamma-ray source

Method used

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  • γ-ray source based on all-optical laser plasma accelerator
  • γ-ray source based on all-optical laser plasma accelerator
  • γ-ray source based on all-optical laser plasma accelerator

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Embodiment Construction

[0043] Summary of gamma ray sources according to embodiments of the invention

[0044] figure 1 is a schematic diagram of a gamma ray source according to an embodiment of the present invention. Such as figure 1 As shown, the γ-ray source device includes a high-power laser system 200 for generating two synchronized high-energy laser pulses 13 and 14, which are compressed through the compression chamber 15 and enter the laser plasma installed in the reaction chamber 36 The volume accelerator 18 and the scattered light focusing mirror 27 will be further described in detail below.

[0045] Since the gamma ray source device of the present invention adopts an optimized structure, its size can be greatly reduced compared with the prior art, so it can be used in basic, medical and industrial applications and research in laboratories with limited space. For example, the gamma ray source device capable of producing gamma rays with an energy of 1 to 20 MeV according to the present inv...

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Abstract

The invention provides a small gamma ray source based on an all-optical laser plasma accelerator. The ray source includes a synchronous dual-output high-power laser system (200), a dual compression-delay system (12), a laser plasma accelerator (18), a particle beam focusing system (24), a scattered light focusing mirror (27) and a particle beam separate system. Wherein, an initial laser pulse is separated and amplified by the laser system (200) to generate two synchronous high-energy laser pulses (10, 11), and the two amplified laser pulses pass through a double compression-delay system (12) at Compressed in the time domain and appropriately delayed to form a pair of driving pulses (13)-scattering pulses (14), the driving pulses (13) pass through a laser plasma accelerator (18) to generate relativistic electron beams (21), particle beams The focusing system (24) is used to transmit the electron beam (21), the scattered light focusing mirror (27) is used to focus the scattered pulse (14) on the electron beam (21) to generate gamma rays (31), and the separation system is used to The electron beams (21) and gamma rays (31) are separated.

Description

technical field [0001] The invention relates to a novel way of realizing a gamma ray source. The invention also relates to the application of the γ-ray source in nuclear physics research, nuclear astrophysics research, detection of nuclear materials or radioactive waste, nuclear batteries, γ-ray lasers and new manufacturing methods of medical isotopes. Background technique [0002] At present, there are mainly the following ways for people to produce gamma rays. [0003] Radioisotopic gamma-ray sources: Natural sources of gamma rays on Earth come from decay processes of radioisotopes such as 40 K (emits gamma rays at 1.46 MeV by trapping electrons) and 60 Co (emits gamma rays at 1.17 and 1.33 MeV by beta decay). These gamma ray sources are widely used in medical treatment (such as gamma knife surgery), non-contact industrial detection, container security inspection facilities, etc. However, due to the limitation of radioactive isotopes, the energy and intensity of gamma-...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21G4/04G21G4/06
Inventor 中岛一久陈民曾明陈黎明盛政明
Owner SHANGHAI JIAOTONG UNIV
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