A method of manufacturing a reticle
A manufacturing method and a reticle technology, which are applied in the photoengraving process, optics, instruments and other directions of the pattern surface, can solve the problems of complex process and other problems, and achieve the effects of simple process, improved alignment accuracy, and improved production efficiency.
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[0036] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0037] Such as figure 1 As shown, the present invention provides a kind of manufacturing method of reticle, wherein manufacturing method comprises the following steps:
[0038] Step 1, uniformly coat the photoresist on the optical element, and bake it into a film; the thickness of the photoresist coating here is 1 micron-10 microns, and the thickness of the photoresist film after baking is 1 micron~ 10 microns;
[0039] Step 2, using a laser plotter to make a hollow alignment mark on the photoresist on the optical element;
[0040] Step 3: aligning and laminating the mother board with the solid alignment mark pattern and the hollow alignment mark on the optical element through the microscope alignment system, and exposing the bonded...
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