Reverse-conducting type insulated gate bipolar transistor structure and manufacturing method thereof
A technology of bipolar transistors and insulated gates, which is applied in the field of reverse conduction insulated gate bipolar transistors and its preparation, can solve problems such as poor reverse recovery characteristics, and achieve the effect of high collector doping concentration
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[0023] see image 3 , a reverse conduction insulated gate bipolar transistor structure provided by an embodiment of the present invention, comprising a collector 1, a second P+ doped layer 2, an N+ doped layer 3, an N+ buffer layer 4, an N-base region 5, a P -base 6, first P+ doped layer 7 and emitter 8; wherein, N+ buffer layer 4, N-base region 5 and P-base 6 form a diode structure, and the top of N-base region 5 is P-base 6, Below the N-base region 5 is an N+ buffer layer 4, above the P-base 6 is a first P+ doped layer 7, and above the first P+ doped layer 7 is formed an emitter 8, a reverse conduction insulated gate bipolar transistor There are second P+ doped layer 2 and N+ doped layer 3 on the back side of the backside, the collector electrode 1 is formed under the second P+ doped layer 2 and N+ doped layer 3, and the N-base region 5 close to the P-base 6 There is a local lifetime control region 9 above, and the introduction of a deep level recombination center of carrie...
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