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Method for manufacturing a pattern retarder

A manufacturing method and retarder technology, applied in the field of retarders, can solve problems such as inconsistent pattern width or irregular pattern boundaries, material reactivity differences, film skew, etc., to avoid pattern damage and collapse, uniform exposure and pattern formation Effect

Inactive Publication Date: 2014-06-11
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, since the foregoing method has a configuration of using two masks or using a single mask including at least two patterns provided thereon, problems such as inconsistent pattern widths or irregular pattern boundaries due to light diffusion, patterns between patterns, etc. Inconsistencies between masks, film skew, and differences in reactivity of materials for alignment layers
In addition, there is a problem of inefficient continuous production of patterned retarders as the frequency of use of masks increases

Method used

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  • Method for manufacturing a pattern retarder
  • Method for manufacturing a pattern retarder
  • Method for manufacturing a pattern retarder

Examples

Experimental program
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Effect test

Embodiment

[0119] For the TAC film purchased from Fuji, Japan, the alignment layer was coated and dried at 100° C. for 1 minute. Using a mask capable of irradiating light onto the first pattern area, the amount of light A (energy, mJ / cm2) indicated in Table 1 below 2 ) emits light along the film moving direction to perform pattern exposure, thereby aligning the first pattern region at +45°.

[0120] Thereafter, light was emitted to both the first pattern area and the second pattern area at the light quantity value B (energy) indicated in Table 1 without using a mask, and it was confirmed that the +45° of the first pattern area was maintained. In the case of the alignment direction, whether the alignment direction of the second pattern region with respect to the film moving direction is changed to -45°.

[0121] After applying the liquid crystal to the alignment layer and drying the liquid crystal at 60° C. for 1 minute, curing and exposure were performed to produce a patterned retarder ...

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Abstract

The present invention relates to a method for manufacturing a pattern retarder. The method for manufacturing the pattern retarder includes: a first step of emitting light onto a first pattern area of an alignment layer formed on a film to align the first pattern area in a predetermined direction; and a second step of emitting light onto at least one portion of the first pattern area aligned in the predetermined direction and onto a second pattern area of the alignment layer to align the second pattern area in a direction different from the aligned direction of the first pattern area without influencing the aligned direction of at least one portion of the first pattern area. Thus, pattern retarders having a uniform width and a clear interface may be quickly and continuously manufactured.

Description

technical field [0001] The present invention relates to a method of manufacturing a patterned retarder that presents a stereoscopic image. Background technique [0002] Patterned retarders (also referred to as "birefringent media" or "retardation films") are commonly applied to stereoscopic image display devices in the form of polar glasses that present stereoscopic images. The patterned retarder is provided on the face of a transflective LCD, etc., and functions as a compensation film that optimizes the optical characteristics of the reflective part and the transmissive part, so it can be used irrespective of the brightness of external light is high or low To achieve good visibility of LCD images. [0003] Regarding the method of manufacturing a patterned retarder, this direction includes: continuously unrolling a film wound on a roll by an exposure system to form an alignment layer on an unrolled part; after drying the alignment layer, performing Light is irradiated to f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/22
CPCG02B27/26G02B5/3083G02B30/25
Inventor 崔凤珍金龙焕河京秀
Owner DONGWOO FINE CHEM CO LTD
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