Method for removing arsenic with industrial hydrofluoric acid

A hydrofluoric acid, industrial technology, applied in the direction of fluorine/hydrogen fluoride, etc., can solve the problems that cannot meet the requirements of electronic grade hydrofluoric acid

Active Publication Date: 2016-02-10
FUJIAN YONGJING TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method is easy to introduce new impurities such as manganese ions and potassium ions, so that the hydrofluoric acid after arsenic removal either contains more other impurities, or the arsenic content can only reach the ppb level, which cannot meet the requirements of electronic grade hydrofluoric acid. Require

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] 1. Prepare a potassium permanganate solution with a mass percentage concentration of 3% (AR grade is selected for potassium permanganate, and pure water is used for water);

[0026] 2. Take a sample from the anhydrous hydrogen fluoride to be removed from the arsenic, and titrate the amount of potassium permanganate consumed by the reducing substances in the sample with a potassium permanganate solution;

[0027] 3. Calculate the amount of potassium permanganate T to be consumed by the anhydrous hydrogen fluoride to be removed from the titration results 2 , and then add T to the anhydrous hydrogen fluoride to be removed from arsenic 2 The potassium permanganate solution of 1.5 times of the amount reacts;

[0028] 4. Rectifying and purifying the reacted hydrofluoric acid to obtain the hydrofluoric acid product.

[0029] The composition content of the above hydrofluoric acid product was tested, and it did not contain manganese ions and potassium ions, and the arsenic con...

Embodiment 2

[0031] 1. Prepare a potassium permanganate solution with a mass percentage concentration of 3% (AR grade is selected for potassium permanganate, and pure water is used for water);

[0032] 2. Take a sample from the anhydrous hydrogen fluoride to be removed from the arsenic, and titrate the amount of potassium permanganate consumed by the reducing substances in the sample with a potassium permanganate solution;

[0033] 3. Calculate the amount of potassium permanganate T to be consumed by the anhydrous hydrogen fluoride to be removed from the titration results 2 , and then add T to the anhydrous hydrogen fluoride to be removed from arsenic 2 The potassium permanganate solution of 1.45 times of the amount reacts;

[0034] 4. Rectifying and purifying the reacted hydrofluoric acid to obtain the hydrofluoric acid product.

[0035] The composition content of the above hydrofluoric acid product was tested, and it did not contain manganese ions and potassium ions, and the arsenic co...

Embodiment 3

[0037] 1. Prepare a potassium permanganate solution with a mass percentage concentration of 3% (AR grade is selected for potassium permanganate, and pure water is used for water);

[0038] 2. Take a sample from the anhydrous hydrogen fluoride to be removed from the arsenic, and titrate the amount of potassium permanganate consumed by the reducing substances in the sample with a potassium permanganate solution;

[0039] 3. Calculate the amount of potassium permanganate T to be consumed by the anhydrous hydrogen fluoride to be removed from the titration results 2 , and then add T to the anhydrous hydrogen fluoride to be removed from arsenic 2 The potassium permanganate solution of 1.55 times of the amount reacts;

[0040] 4. Rectifying and purifying the reacted hydrofluoric acid to obtain the hydrofluoric acid product.

[0041] The composition content of the above hydrofluoric acid product was tested, and it did not contain manganese ions and potassium ions, and the arsenic co...

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PUM

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Abstract

The invention relates to a method for removing arsenic from an industrial hydrofluoric acid. The method comprises the following steps: firstly, inexpensively, efficiently and accurately calculating the quantity T2 of potassium permanganate to be consumed for removing arsenic out of anhydrous hydrogen fluoride by utilizing a small quantity of samples and the accuracy of a titration result in a sampling titration mode; then adding a potassium permanganate solution of which the adding quantity is 1.45 to 1.55 times as much as T2; and reacting the potassium permanganate solution with the anhydrous hydrogen fluoride in which the arsenic needs to be removed. The experimental result shows that although the hydrofluoric acid obtained by the reaction based on the current adding quantity contains slightly excessive potassium permanganate (existing in the forms of manganese ion and potassium ion), the potassium permanganate in the hydrofluoric acid can be completely removed through rectification and purification; and the content of the arsenic in the finally obtained hydrofluoric acid is below 100ppt (Parts Per Trillion), thereby completely reaching the requirement of the electronic-grade hydrofluoric acid.

Description

technical field [0001] The invention relates to the technical field of chemical industry, in particular to a method for removing arsenic with industrial hydrofluoric acid. Background technique [0002] In the process of producing electronic grade hydrofluoric acid, heavy metal arsenic exists in a trivalent state. Since the boiling point of arsenic in the trivalent state is almost equal to that of hydrofluoric acid, it cannot be removed by rectification or degassing, relying solely on the process The improvement has been difficult to remove it. For this reason, people have adopted a new chemical removal method, that is, by adding potassium permanganate solution to anhydrous hydrogen fluoride to change its chemical composition, so that the trivalent arsenic becomes the pentavalent arsenic, and the The boiling point of arsenic in the pentavalent state is much higher than that of hydrofluoric acid, so it can be removed well by rectification. However, this method is easy to int...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B7/19
Inventor 曹武亮吴云秀
Owner FUJIAN YONGJING TECH CO LTD
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