15 results about "Sodium permanganate" patented technology

Provided is a polishing composition capable of realizing high polishing removal rate on an object to be polished. The polishing composition provided by this invention is used for polishing an object to be polished. The polishing composition includes water, sodium permanganate as an oxidant, and a transition metal salt different from the oxidant. The polishing composition includes the oxidant in an amount of more than 10 wt %. In some preferable embodiments, the transition metal salt is an oxo-transition metal salt, or a multi-nuclear transition metal complex including a transition metal and one or both of oxygen and hydrogen. The polishing composition can be preferably used in polishing an object formed of a high-harness material having a Vickers hardness of 1500 Hv or higher.

The invention discloses a preparation method of a metal-doped manganese dioxide aqueous zinc ion battery positive electrode material, which comprises the following steps of: preparing a solution from any one of potassium permanganate, potassium manganate, sodium permanganate and sodium manganate, and recording the solution as a solution A; preparing a solution from any one of oxalic acid, citric acid, formic acid, acetic acid, sodium hydrogen sulfite and phosphorous acid, and recording the solution as a solution B; 2-10 ml of the solution B and aluminum salt are weighed and added into the solution A, ultrasonic dispersion is carried out, stirring is carried out for 20-120 min, and a mixed solution is obtained; and transferring the mixed solution into a polytetrafluoroethylene high-pressure reaction kettle, putting the polytetrafluoroethylene high-pressure reaction kettle into a drying oven at 120-180 DEG C, carrying out heating reaction for 10-24 hours, naturally cooling to room temperature, washing the reactant with water and ethanol, centrifuging, and carrying out vacuum drying to obtain the aluminum-doped delta-MnO2 positive electrode material. The positive electrode material is applied to the field of aqueous zinc ion batteries, the specific capacity of the battery positive electrode is extremely high, the battery positive electrode has very excellent cycling stability and high-rate charge-discharge characteristics, and raw materials used for synthesis are non-toxic and low in price.

The present application belongs to the technical field of wastewater treatment, and specifically discloses a method for removing fluorine and COD from copper smelting process wastewater after sulfuration, which comprises the following steps: first, calculating the amount of potassium permanganate required for the reaction of fluorine and sodium silicate in the copper smelting process wastewater after sulfuration; then, adding the potassium permanganate into the copper smelting process wastewater after sulfuration for heating and stirring to obtain a mixed solution; then, adding a coagulant into the mixed solution for mixing and stirring to obtain a flocculation solution; finally, filtering the flocculation solution to obtain a precipitate containing nickel and a purified solution. The introduction of potassium permanganate promotes the transformation of sodium silicofluoride, and the fluorine-containing compounds are removed from the system in the form of precipitation. The newly generated sodium permanganate can effectively degrade the COD in the wastewater, improve the fluorine removal efficiency and depth, and also help to degrade the COD to a certain extent, thereby reducing the wastewater treatment cost.

Provided is a polishing composition that can exhibit an excellent polishing removal rate and has a suitably suppressed combustion promoting property. A polishing composition disclosed herein comprises: sodium permanganate and potassium permanganate as an oxidizing agent; abrasive grains composed of a material having a Mohs hardness of 6 or more; and water. The ratio (CK / CS) of the concentration CK [mM] of the potassium permanganate to the concentration CS [mM] of the sodium permanganate is 0.33 or more. The content of the sodium permanganate is less than 22.5 wt%.

This invention discloses a method for preparing a high-capacity, high-cycle-performance layered manganese dioxide cathode material. The method involves first immersing carbon cloth in a sodium permanganate solution, followed by a hydrothermal reaction to obtain a sample grown on the carbon cloth. Then, sodium hypophosphite is used as a phosphorus source for phosphating. Finally, electrochemical treatment yields a layered manganese dioxide material containing phosphorus in the bulk phase. This invention employs a simple method to prepare layered manganese dioxide doped with phosphorus in both the surface and bulk phases. The prepared layered manganese dioxide cathode material exhibits high capacity and long-cycle stability at a current density of 1 mA cm⁻¹. ‑2 At that time, the specific capacity was as high as 528 F g. ‑1 At a current density of 10 A g ‑1 It can still maintain 99% after 30,000 cycles.

The invention relates to the field of metal iron-based surface coating, and discloses a water-based pretreatment agent, a preparation method and application thereof, and a preparation method of a hot-dip galvanized color-coated sheet, the raw materials for preparing the water-based pretreatment agent comprise a water-soluble resin polymer, metal salts, an oxidizing agent, a hole sealing agent, an auxiliary agent, an organic solvent and water; wherein the water-soluble resin polymer contains water-based acrylic resin and water-based polyurethane resin; the metal salts comprise a titanium salt, a zirconium salt, a molybdenum salt and a cerium salt; the oxidizing agent is sodium permanganate; perfluorooctyl trichlorosilane is adopted as the hole sealing agent; the auxiliary agent contains polyphosphate and phytic acid; the organic solvent contains normal propyl alcohol and methyl acrylate; by developing a novel pretreatment formula, the problems of poor adhesive force and reduced durability of the hot-dip galvanized environment-friendly color-coated sheet in the processing process can be solved.

The application provides a high-efficiency high-flatness silicon carbide fine polishing polishing liquid, which comprises an A agent and a B agent; the A agent comprises an oxidizing agent, a first dispersing agent, a first bactericide, a pH regulator and water; the B agent comprises an abrasive, a second dispersing agent, a second bactericide, a film forming agent, a pH regulator and water; the abrasive is cerium oxide, the oxidizing agent is a compound of potassium permanganate and sodium permanganate, and the film forming agent is zirconium nitrate; the A agent and the B agent are mixed before use, and the pH value of the polishing liquid after mixing is 3-5. The polishing liquid has good synergistic effect of each component, a wide process window, and can effectively solve the technical problems that high removal rate (≥450nm / h), low roughness (Ra<0.5nm) and low defects are difficult to be coordinated in silicon carbide polishing.

The invention discloses an H2S adsorbent for the generic semiconductor industry and a preparation method thereof, and the adsorbent comprises the following raw materials by weight: 80-90 parts of a carrier, 20-40 parts of a 30%-50% sodium permanganate solution, 1-10 parts of calcium carbonate and 1-3 parts of sodium acetate. The H2S adsorbent for the generic semiconductor industry provided by the invention adopts a carrier with a relatively stable supporting structure, is not easily limited by the drying degree of gas, can effectively adsorb hydrogen sulfide, has a relatively good effect in the field of air purification, and plays a role in protecting the environment.

The invention discloses a manganese sulfate solution-based sodium permanganate in-situ reaction deep adsorption molybdenum removal process, which comprises the following steps of: taking a manganese sulfate solution, and pouring the manganese sulfate solution into a container; the PH value of the solution in the container is adjusted to 3.0-3.5, and the temperature in the container is increased to 60 DEG C or above; sodium permanganate is added into the manganese sulfate solution, manganese sulfate is oxidized by permanganate radicals in the sodium permanganate, chemical manganese dioxide is directly generated in the container, and molybdenum in the container is adsorbed by the chemical manganese dioxide. The method has the beneficial effects that potassium ions are not remained in the solution after the oxidant is added, the problem of overhigh concentration of the potassium ions in the solution can be directly avoided, and when the concentration of the potassium ions in the electrolytic manganese dioxide for preparing the alkaline zinc-manganese battery is overhigh, the corrosion of a zinc negative electrode in the alkaline zinc-manganese battery can be reduced, and the service life of the alkaline zinc-manganese battery is prolonged. The molybdenum removal process has the advantage that the concentration of the residual potassium ions in the manganese sulfate solution is relatively low.

The invention provides a preparation method of a low-heavy-metal and low-sulfate sodium permanganate solution, and relates to the technical field of inorganic chemical industry. Mixing the sodium permanganate concentrated solution with a desulfurizing agent for first reaction, mixing the obtained reactant with a pH regulator, and carrying out first solid-liquid separation to obtain a desulfurized clear solution; mixing the desulfurized clear liquid with a heavy metal adsorbent for second reaction, and performing second solid-liquid separation to obtain an adsorbed clear liquid; and mixing the adsorption clear liquid with a diluent, and carrying out third solid-liquid separation to obtain a sodium permanganate solution. The method comprises the following steps: reacting a desulfurizer with a sodium permanganate concentrated solution to generate a sulfuric acid precipitate which exists in a system in a crystal form, adding a pH regulator, carrying out solid-liquid separation to obtain a desulfurized clear solution, and forming coordinate bonds by a heavy metal adsorbent and heavy metals in the desulfurized clear solution, so that the heavy metals are selectively separated from the desulfurized clear solution. The requirements of different industries on the high-quality sodium permanganate solution can be met.

Preparation method of a cathode material for a doped manganese-based sodium ion battery, comprising the following steps: S1: Dissolving one or both of antimony trioxide and bismuth trioxide with an acid and subsequently adding a divalent manganese salt to produce a mixed metal salt solution; S2: Adding the mixed metal salt solution to an excess alkaline oxidizing agent solution for the reaction, and after the reaction is complete, carrying out a solid-liquid separation to obtain a solid material, such that manganese ions are oxidized to manganese dioxide, and antimony is co-precipitated with the manganese dioxide to a form of sodium hexahydroxyantimonate, or bismuth is co-precipitated with the manganese dioxide to a form of sodium bismuthate, thereby ensuring the homogeneity of doped elements in the cathode material and achieving atomic-level mixing between the elements; and S3: Drying the solid material and subsequent mixing with a sodium source and sintering of a resulting mixture to obtain the cathode material for the doped manganese-based sodium ion battery; wherein, in step S2, the alkaline oxidizing agent solution is a sodium hydroxide solution in which one or more of sodium hypochlorite, sodium chlorate, and sodium permanganate are dissolved; wherein, in step S2, the mixed metal salt solution is added dropwise, the alkaline oxidizing agent solution always has a pH equal to or greater than 10.5, and one oxidizing agent in the alkaline oxidizing agent solution is always sufficient; and wherein, in step S2, the temperature of the reaction is controlled to between 2 °C and 10 °C.

The present invention provides a polishing composition wherein combustive properties are reduced despite the use of sodium permanganate as an oxidizing agent, and solubility is not diminished. A polishing composition disclosed herein contains sodium permanganate that serves as an oxidizing agent, a metal salt A, and water. With respect to the metal salt A, (i) the metal salt A is a salt of an anion and a cation a that contains a metal having a pKa of a hydrated metal ion of 7.0 or more, and (ii) the solubility in water at 20°C of a permanganate salt of the cation a is equal to or lower than that of sodium permanganate. The concentration CA of the metal salt A is 200 mM to 550 mM inclusive. In addition, the content of sodium permanganate is more than 1% by weight.

Methods and compositions for rapid verification of cleaning performance on surfaces in cleaning-in-place (CIP) systems and in cleaning-in-place (COP) systems and in high flow areas. The solution comprises alkali metal hydroxide; one or more oxidizing compounds, wherein the one or more oxidizing compounds comprise sodium hypochlorite, potassium hypochlorite, sodium persulfate, potassium persulfate and monopersulfate; and one or more compounds selected from the group consisting of potassium permanganate, sodium permanganate, potassium dichromate, and sodium dichromate. In some examples, the solution also includes potassium tripolyphosphate, sodium tripolyphosphate, or other tripolyphosphate. The substrate is in contact with the solution, and a chromogenic reaction may occur indicating the presence of an organic substance or non-organic contaminant. The chromogenic reaction may occur within less than 30 minutes and at a temperature of 10 DEG C to 60 DEG C.

To provide a method for producing an aqueous solution of sodium manganate having high solubility from a by-product of a smelting process of a metal containing manganese dioxide at a low production cost.SOLUTION: A method for producing an aqueous sodium manganate solution, comprising an oxidation step of heating a slurry obtained by mixing a manganese compound containing manganese dioxide and an aqueous sodium hydroxide solution in an oxidizing atmosphere in a temperature range of 200 °C or more and 700 °C or less to oxidize tetravalent manganese to hexavalent manganese, and a leaching step of immersing a solid containing hexavalent manganese obtained in the oxidation step in an alkaline aqueous solution to leach out hexavalent manganese as manganate ions.SELECTED DRAWING: None

This invention generally relates to a method for the reduction of elemental sulfur content in gypsum, and by extension, products that are derived from it such as gypsum wallboard. More specifically, and in one embodiment, this invention relates to using the effectiveness of potassium permanganate or sodium permanganate in reducing elemental sulfur content in a gypsum wallboard or its precursor materials.