Preparation method of substrate

A technology for substrates and alignment marks, which is applied to the photolithographic process of the pattern surface, photographic process coating equipment, instruments, etc., which can solve the impact, affect the COA substrate opening rate and yield rate, and the pattern cannot be accurately aligned, etc. Problems, to achieve accurate alignment, to ensure the effect of opening rate and yield rate

Active Publication Date: 2014-07-16
BOE TECH GRP CO LTD
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Problems solved by technology

[0004] The inventors found that since the pattern of the black matrix of the COA substrate needs to be precisely aligned with the structure under the black matrix such as gate lines and data lines, alignment marks are usually formed on the COA substrate to facilitate the exposure machine to perform black matrix At the same time, the black matrix must reach a certain thickness to achieve its functions of shading and improving contrast. At this time, the black matrix will affect the exposure machine to recognize the alignment mark, resulting in the pattern of the black matrix cannot be accurately aligned, affecting Aperture ratio and yield rate of COA substrate

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  • Preparation method of substrate
  • Preparation method of substrate

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0032] Embodiments of the present invention provide a method for preparing a substrate, such as figure 1 Shown, the preparation method of this substrate comprises:

[0033] Step S101, forming an alignment mark.

[0034] Such as figure 2 As shown, an alignment mark 2 is formed on a base substrate 1 .

[0035] Wherein, the alignment mark 2 on the substrate is formed on the edge of the base substrate 1 while forming the first layer structure on t...

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Abstract

The invention discloses a preparation method of a substrate, which relates to a display field. The preparation method realizes accurate alignment of the pattern of a black matrix, and aperture ratio and yield of the substrate can be ensured. The preparation method of the substrate comprises the following steps: forming an align mark; forming a black resin layer, wherein the align mark is covered by the black resin layer; arranging a heat conduction contact on an opposed face of the align mark on the substrate, arranging the heat conduction contact by corresponding with the align mark; and pre-baking the black resin layer.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for preparing a substrate. Background technique [0002] In recent years, people have higher and higher requirements on light transmittance, resolution, and power consumption of display devices, and display devices are developing towards high transmittance, high resolution, and low power consumption. Among them, the higher the resolution, the smaller the size of each pixel unit. When the side length of the pixel unit changes from tens of microns to more than ten microns, obviously, the size of the pixel unit has been greatly reduced. At this time , if the width of the black matrix dividing the pixel units remains unchanged, the black matrix will become obvious relative to the pixel units, which will affect the display effect of the display device. [0003] Therefore, one of the integration technologies (Color Filter on Array, COA for short) that integrates the color fi...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00G03F7/16
Inventor 舒适张锋谷敬霞姚琪曹占峰贺芳邓伟
Owner BOE TECH GRP CO LTD
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