Cavity cleaning method of plasma etching device
A technology of plasma and etching equipment, which is applied in the field of cavity cleaning of plasma etching equipment, can solve problems such as difficult cleaning, increase of agglomeration defects, and decrease of cleaning effect, so as to prolong residence time, optimize agglomeration defects, increase etch The effect of corrosion reaction
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[0024] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be further described below in conjunction with the accompanying drawings. Of course, the present invention is not limited to this specific embodiment, and general replacements known to those skilled in the art are also covered within the protection scope of the present invention.
[0025] figure 2 shows a flow chart of the cavity cleaning method of the plasma etching device of the present invention, Figure 3a ~ 3f A cavity cleaning method of a plasma etching device provided in an embodiment of the present invention is shown. It should be understood that the plasma etching device in the figure is only exemplary, and it may include fewer or more constituent elements, or the arrangement of the constituent elements may be the same as Figure 3a ~ 3f shown differently.
[0026] like Figure 3a ~ 3f As shown, the plasma etching device include...
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