Scratched mask repair apparatus and method

A mask and repairing liquid technology is applied in the field of scratched mask repairing devices, which can solve the problems of long mask repairing cycle and high cost, and achieve the effects of shortening the repairing cycle, complete functions and low cost.
CN103969945AActive Publication Date: 2014-08-06SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Publication Date
2014-08-06

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Abstract

The present invention discloses a scratched mask repair apparatus and a method. The apparatus comprises a bracket device, a defect detection device and a repair module, wherein the bracket device is arranged in a photolithography machine chamber, the defect detection device and the repair module are arranged on the bracket device, and the repair module comprises a plurality of repair refills with different sizes. According to the present invention, the bracket device of the scratched mask repair apparatus is directly arranged in the photolithography machine chamber, and can timely and rapidly perform repair in the photolithography machine during mask scratching without influence on productivity of the photolithography machine, such that the function of the photolithography machine is complete, the automation degree of the photolithography machine is high, the mask repair can be directly completed in the photolithography machine, and the internal space of the photolithography machine is completely utilized so as to substantially shorten the repair period and provide characteristics of simpleness, rapidness, low cost, and no influence on productivity.
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Description

technical field

[0001] The invention relates to the field of photolithography machine manufacturing, in particular to a scratch mask repairing device and method applicable to the interior of a photolithography machine. Background technique

[0002] In the LCD (liquid crystal display) manufacturing industry, the lithography process of the color filter requires the use of a lithography machine. Because the price of the proximity lithography machine is much lower than that of the step-and-scan lithography machine, it can also meet the requirements of the color filter. The various characteristics and specifications of the film, so the lithography process of the industry's color filters uses proximity lithography equipment. However, in the actual production process, due to the small gap between the mask of the proximity lithography machine and the product on the stage, generally below 300um, the mask is easily polluted and scratched. After contamination, it can be cleaned in the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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