Scratch mask repairing device and method
A mask and repair fluid technology, which is applied in the field of scratch mask repair devices, can solve the problems of high cost and long mask repair cycle, and achieve the effects of complete functions, shortened repair cycle, and low cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0026] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that all the drawings of the present invention are in simplified form and use inaccurate scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0027] Please refer to Figure 1~4 , the present invention provides a scratch mask repairing device, including a bracket device 1 , a defect detection device 2 , a control module (not shown) and a repairing module 3 . Wherein, the support device 1 is installed in the photolithography chamber for fixing the scratched mask, and the defect detection device 2 and the repair module 3 are both installed on the support device 1 . Specifically, the support device 1 can be suspended in any free space of the lit...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com