Device for precisely controlling the temperature of immersion liquid in immersion lithography machine and its temperature control method

Abstract

The invention discloses a device for precisely controlling temperature of immersing liquid of an immersed photoetching machine. The device comprises a pressurization pump, a primary heat exchanger, a secondary heat exchanger and a flow servo valve, wherein an immersing liquid inlet of the primary heat exchanger is communicated with an outlet of the pressurization pump, and the immersing liquid is subjected to heat exchange in the primary heat exchanger so as to realize primary control on the temperature of the immersing liquid; an immersing liquid inlet of the secondary heat exchanger is communicated with an immersing liquid outlet of the primary heat exchanger, and the immersing liquid is subjected to heat exchange in the secondary heat exchanger so as to realize secondary control on the temperature of the immersing liquid; an inlet of the flow servo valve is communicated with the immersing liquid outlet of the primary heat exchanger; the flow servo valve is connected in parallel with the secondary heat exchanger and is used for adjusting the flow of the immersing liquid entering the secondary heat exchanger. The flow of coolants entering the primary heat exchanger and the secondary heat exchanger are cooperatively controlled, and the flow servo valve is used for adjusting the flow of the immersing liquid entering the secondary heat exchanger, so that two-stage control on the temperature of the immersing liquid can be realized, and the immersing liquid with stable and precise temperature is obtained and used for an immersed type photoetching technology.

Description

technical field [0001] The invention relates to an immersion photolithography machine, in particular to a device for precisely controlling the temperature of the immersion liquid of the immersion photolithography machine and a temperature control method thereof. Background technique [0002] In the traditional lithography technology, the medium between the lens and the photoresist is air. The immersion technology replaces the air medium with a liquid. After the light passes through the liquid medium, the wavelength of the light source is shortened. According to the following Rayleigh criterion: [0003] R = k 1 λ NA [0004] Among them, R is the lithography resolution of the optical lithography system, k 1 is the process factor, λ is the exposure wavelength, and NA is the numerical aperture. According to the Rayleigh criterion, when the exposure wavelength is shortened and th...

AI Technical Summary

Problems solved by technology

In practice, the immersion lithography machine has extremely high requirements on the immersion liquid, and deionized and degassed ultrapure water is required. The temperature control of the immersion liquid by thermoelectric refrigeration is not conducive to the pollution control of the immersion liquid, and it has a great impact on the immersion liquid. The liquid adopts the method of primary temperature control, which lacks the ability of secondary temperature control, and its temperature control method cannot make the temperature of the immersion liquid accurate and stable.

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