Formation method of semiconductor structure

Abstract

A method for forming a semiconductor structure comprises the following steps: S101, providing a semiconductor substrate; S102, forming a first dielectric layer on the surface of the semiconductor substrate by use of a first deposition process; S103, performing surface treatment on the surface of the first dielectric layer to remove a convex part on the surface of the first dielectric layer after the first deposition process; and S104, forming a second dielectric layer on the surface of the semiconductor substrate by use of a second deposition process after the surface treatment process, wherein the rate of the second deposition process is lower than that of the first deposition process. A semiconductor structure formed by the method has good quality.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method for forming a semiconductor structure. Background technique [0002] With the rapid development of integrated circuit manufacturing technology, the size of semiconductor devices in integrated circuits is continuously reduced, so as to meet the requirements of miniaturization and integration in the development of integrated circuits. As the size of semiconductor devices continues to shrink, the process of forming conductive plugs for electrical interconnection between semiconductor devices is also challenged, thereby affecting the performance of semiconductor devices. [0003] Figure 1 to Figure 4 It is a schematic cross-sectional structure diagram of the formation process of a conductive plug electrically connected to a source region or a drain region of a transistor in the prior art, including: [0004] Please refer to figure 1 , provide a semico...

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Problems solved by technology

[0008] However, with the improvement of the integration level of integrated circuits, the conductive plugs formed by the prior art have poor morphology, which easily causes problems such as short circuit or open circuit of the integrated circuit.

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