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Self-assembled structures, method of manufacture thereof and articles comprising the same

A technology of composition and grafted polymer, which is applied in the photoplate making process of patterned surface, photosensitive materials used in optomechanical equipment, instruments, etc., and can solve the problems of light intensity modulation loss and so on

Inactive Publication Date: 2014-09-17
ROHM & HAAS ELECTRONIC MATERIALS LLC +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, top-down lithography, as far as optical lithography is concerned, is limited by the smallest pattern it can form because light diffracts through mask openings with dimensions similar to or smaller than the wavelength, resulting Loss of light intensity modulation between shielded areas

Method used

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  • Self-assembled structures, method of manufacture thereof and articles comprising the same
  • Self-assembled structures, method of manufacture thereof and articles comprising the same
  • Self-assembled structures, method of manufacture thereof and articles comprising the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0105] First Polymer-(NB-P(TFpHS) 12 )Synthesis. This example is intended to illustrate the manufacture of the first polymer. The terms used here are as follows: NB-norbornene with chain transfer agent; TF-tetrafluoro; pHS-p-hydroxystyrene; P(TFpHS) 12 ) - poly(tetrafluoro-p-hydroxystyrene) with 12 repeating units.

[0106] The first polymer was produced as follows. Norbornene-chain transfer agent (NB-CTA) (301 milligrams (mg), 0.782 millimoles (mmol)), tetrafluoro-p-hydroxystyrene (TFpHS) (4.49 g, 23.4 mmol), azobis Isobutyronitrile (AIBN) (12.7 mg, 78.2 micromole (μmol)), and 10.5 mL of 2-butanone were added to a 25 mL Schlenk flask equipped with a magnetic stir bar that had been placed under N 2 The atmosphere is dried by flames. The mixture was stirred at room temperature (RT) for 10 minutes (min) and degassed by five freeze-pump-thaw cycles. After the last cycle, the reaction mixture was stirred at RT for 10 minutes and the copolymerization reaction was initiated by...

Embodiment 3

[0112] The second polymer-(NB-P(pHS 13 --PhMI 13 ))Synthesis. This example is intended to illustrate the fabrication of the second polymer. The terms used here are as follows: NB-norbornene with chain transfer agent; pHS-p-hydroxystyrene; PhMI-N-phenylmaleimide; P(pHS13-co-PhMI13)-poly(p- hydroxystyrene-co-N-phenylmaleimide), wherein p-hydroxystyrene is polymerized to contain 13 repeating units and N-phenylmaleimide is polymerized to poly(p-hydroxystyrene ) and also has 13 repeat units.

[0113] The second polymer was produced as follows. NB-CTA (635 mg, 1.65 mmol), pHS (3.95 g, 33.0 mmol), PhMI (5.76 g, 33.0 mmol), AIRN (26.7 mg, 165 μmol), and 35 mL of anhydrous 1,4-dioxane were added into a 100-mL Schlenk flask equipped with a magnetic stir bar that had been placed under N 2 The atmosphere is dried by flames. The mixture was stirred at RT for 10 min and degassed by four freeze-pump-thaw cycles. After the last cycle, the reaction mixture was stirred at RT for 15 minu...

Embodiment 4

[0115] The second polymer-(NB-P(pHS 8 -Co-PhMI 8 ))Synthesis. This example is also intended to illustrate the fabrication of the second polymer. The terms used here are as follows: NB-norbornene with chain transfer agent; pHS-p-hydroxystyrene; PhMI-N-phenylmaleimide; P(pHS 8 -Co-PhMI 8 )-poly(p-hydroxystyrene-co-N-phenylmaleimide), wherein p-hydroxystyrene is polymerized to contain 8 repeating units and N-phenylmaleimide is polymerized to poly (p-hydroxystyrene) and also has 8 repeating units.

[0116] The second polymer was produced as follows. NB-CTA (802 mg, 2.08 mmol), pHS (2.50 g, 20.8 mmol), PhMI (3.60 g, 20.8 mmol), AIBN (16.9 mg, 104 μmol), and 20 mL of anhydrous 1,4-dioxane were added into a 50 mL Schlenk flask equipped with a magnetic stir bar, which had been placed under N 2 The atmosphere is dried by flames. The mixture was stirred at RT for 10 min and degassed by four freeze-pump-thaw cycles. After the last cycle, the reaction mixture was stirred at RT fo...

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Abstract

The invention discloses a composition comprising grafted block copolymer, a photo-acid generator, and a crosslinking agent. The grafted block copolymer comprises first block polymer and second block polymer; wherein the first block polymer comprises main chain polymer and first grafted polymer, the first grafted polymer comprises a part with reduced surface energy, the second block polymer is connected to the first block polymer through a covalent bond, the second bock polymer comprises main chain polymer and second grafted polymer, and the second grafted polymer comprises an functional group effective on the crosslinked grafted block polymer.

Description

Background technique [0001] The present invention relates to self-assembling structures, methods of making them and articles comprising them. [0002] Block copolymers form self-assembled nanostructures to reduce the free energy of the system. Nanostructures are those structures having an average maximum width or thickness of less than 100 nanometers (nm). This self-assembly produces periodic structures due to the reduction of free energy. Periodic structures can be in the form of domains, lamellae or cylinders. Due to these structures, thin films of block copolymers provide spatial chemical contrasts at the nanoscale and, therefore, they serve as an alternative, inexpensive nano-patterning material for generating nanoscale structures. While these block copolymer films can provide differentiation at the nanometer scale, it is often difficult to produce those copolymer films that can exhibit periodicity less than 60 nm. However modern electronic devices often utilize period...

Claims

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Application Information

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IPC IPC(8): G03F7/038G03F7/00
CPCC08G2261/126C08F2438/03G03F7/038C08G2261/136C08G2261/146G03F7/004G03F7/2004G03F7/0046G03F7/0382G03F7/40G03F7/11C08L51/00
Inventor J·W·撒克里P·特雷福纳斯三世赵祥浩G·孙K·L·伍利
Owner ROHM & HAAS ELECTRONIC MATERIALS LLC
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