Light-emitting diode electrode structure and manufacturing process thereof
A technology of light-emitting diode and electrode structure, which is applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of increasing product defect rate and alignment error, and achieve the effect of reducing defect rate, reducing error and improving production efficiency
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[0021] Such as figure 1 The electrode structure of a light-emitting diode shown includes a light-emitting component 2, an n-electrode layer 1 is provided below the light-emitting component 2, a p-electrode layer 3 is provided above the light-emitting component 2, and a p-pad 5 is provided above the p-electrode layer 3. A barrier layer 4 is provided between the electrode layer 3 and the p pad 5, the thickness of the barrier layer 4 is 0.1-1 μm, and the material of the barrier layer 4 is an alloy of titanium, tungsten, tantalum, and molybdenum, such as TiW, TaW, or silicon compound, nitrogen compound or silicon nitride compound of the above materials, such as TiN, WN, TaN, TaSiN, WSiN, TWN, p-electrode layer 3 is gold-zinc alloy, gold-beryllium alloy or titanium-platinum alloy, p pad 5 It is an alloy of titanium and aluminum, an alloy of titanium and gold, or an alloy of titanium, aluminum and gold, and the total thickness of the p-pad 5 is 0.5-3.0 μm. The process for producin...
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