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Prism optical system, illumination optical system, exposure apparatus, and device manufacturing method

An illumination optical system and optical system technology, applied in the field of prism optical system, can solve the problems of light utilization efficiency reduction and so on

Active Publication Date: 2017-04-12
CANON KK
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This prevents part of the light from entering subsequent optical elements and makes light use less efficient

Method used

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  • Prism optical system, illumination optical system, exposure apparatus, and device manufacturing method
  • Prism optical system, illumination optical system, exposure apparatus, and device manufacturing method
  • Prism optical system, illumination optical system, exposure apparatus, and device manufacturing method

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Embodiment Construction

[0025] Various exemplary embodiments, features, and aspects of the present invention will be described in detail below with reference to the accompanying drawings.

[0026] refer to Figure 1-8 The structure of the illumination optical system according to the first exemplary embodiment of the present invention is described.

[0027] The illumination optical system according to the exemplary embodiment is used, for example, in an exposure apparatus. The illumination optical system is a device for guiding light emitted from a light source to a mask (reticle) that is a target to be irradiated. A pattern is formed on the mask. The exposure apparatus forms an image with a projection optical system by using diffracted light from the pattern of the mask, and projects the image of the pattern of the mask on a substrate (eg, a wafer and a glass plate) to expose the substrate.

[0028] figure 1 is a schematic structural view showing an illumination optical system according to an ex...

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Abstract

The invention relates to a prism optical system, an illumination optical system, an exposure apparatus, and a device manufacturing method. The prism optical system is configured to change the shape of the cross section of a light beam and comprises a light incoming surface, a light outgoing surface and an outer surface. The light incoming surface comprises a concave conical surface. The light outgoing surface comprises a concave conical surface. The out surface comprises a reflection surface used for reflecting light which enters the outer surface from the light incoming surface.

Description

technical field [0001] The present invention relates to a prism optical system, an illumination optical system, an exposure apparatus, and a method for manufacturing the device. Background technique [0002] When manufacturing semiconductor devices, liquid crystal display devices, and other devices, in the photolithography step, exposure equipment is used to irradiate a mask (reticle) with an illumination optical system and to project an image of the mask pattern through a projection optical system onto the substrate. A photoresist layer is formed on the substrate. In such an exposure apparatus, in order to ensure the depth of focus while maintaining high resolution, the effective light source distribution (illumination conditions) is optimized according to the mask pattern. The effective light source distribution is the light intensity distribution on the pupil plane in the illumination optical system, and is also the angular distribution of light entering the mask (surfa...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCF21V5/02G02B19/00G03F7/20H01L21/027
Inventor 大阪昇福冈亮介吉冈均
Owner CANON KK