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Distortion measuring apparatus of wave aberration measuring module, and distortion correction method

A measurement module and measurement device technology, which is applied in the direction of photolithography exposure device, test optical performance, micro-lithography exposure equipment, etc., can solve the problem of unable to measure the overall distortion of the wave aberration measurement module, to achieve increased complexity, Distortion measurement system is simple and the effect of improving accuracy

Active Publication Date: 2015-03-11
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, this method can only measure the distortion of the CCD alone, and cannot measure the overall distortion of the wave aberration measurement module

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  • Distortion measuring apparatus of wave aberration measuring module, and distortion correction method
  • Distortion measuring apparatus of wave aberration measuring module, and distortion correction method
  • Distortion measuring apparatus of wave aberration measuring module, and distortion correction method

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Embodiment Construction

[0039] In order to better understand the purpose, technical solutions and advantages of the embodiments of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and embodiments, but the protection scope of the present invention should not be limited thereby.

[0040] figure 1 Shown is a distortion measurement device of a wave aberration measurement module. The light source or the wave aberration optical system module 1 to be measured emits spherical waves, which are perpendicularly incident on the standard template 2 , and thereafter, the incident light carries the position information of the calibration mark on the standard template 2 . The light beam continues to propagate to the wave aberration measurement module 3, and becomes a group of parallel lights after being collimated by the Fourier lens 3-1 inside the wave aberration measurement module 3. Due to the distortion of the Fourier lens 3-1 itself, the...

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Abstract

The invention discloses a distortion measuring apparatus of a wave aberration measuring module, and a distortion correction method. The apparatus comprises a light source, a standard template, a wave aberration measuring module, a precision adjusting bench and a data processing unit, wherein the wave aberration module is composed of a Fourier lens and an image acquisition element, and the standard template is used for distortion measurement of the wave aberration measuring module. According to the invention, the standard template is arranged between the light source and the wave aberration measuring module, a high-precision positioning mark is prepared on the standard template, and the image acquisition element acquires an image and outputs the image to the data processing unit. The data processing unit performs image identification on the positioning mark of the image, then carries out mapping calculation of distortion, and performs distortion position correction and wave aberration data correction on a wave aberration measuring result, such that the wave aberration measuring precision is improved, and the apparatus and the method provided by the invention are applied to distortion measurement of the wave aberration measuring module of interferometry and non-interferometry.

Description

technical field [0001] The invention relates to a distortion measurement method of an optical system, in particular to a measurement device and a distortion correction method for the distortion of a wave aberration measurement module. Background technique [0002] For the objective lens imaging system or the wave aberration high-precision detection system of the spherical wave light source, how to remove the measurement system error and improve the detection accuracy is the research goal of the high-precision wave aberration detection system. For the wave aberration measurement system, the systematic error introduced by the measurement system itself is removed by means of two measurements. For example, a high-precision system wave aberration detection method proposed in the Chinese Patent Application Publication (Application No. 201110346849.0, Publication No. CN 102368139A), and a measurable system proposed in the Chinese Patent Application Publication (Application No. 2009...

Claims

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Application Information

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IPC IPC(8): G01M11/02G03F7/20
Inventor 卢云君唐锋王向朝
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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