Device and method for measuring ultralow liquid flow rate

Abstract

The invention discloses a device for measuring the ultralow liquid flow rate. The device comprises a liquid storage tank and a circulation pool, wherein the liquid storage tank and the circulation pool are connected through a pipeline to form a liquid circulation loop. A temperature sensor, a reference electrode and a pH glass electrode are placed in the liquid storage tank. A tungsten oxide electrode is placed in the circulation pool. An open-circuit voltage E1 detection unit is arranged between the tungsten oxide electrode and the reference electrode. An open-circuit voltage E2 detection unit is arranged between the reference electrode and the pH glass electrode. The device further comprises a processor used for calculating the ultralow flow rate of liquid according to E1, E2 and the temperature value T measured through the temperature sensor. The invention further discloses a method for measuring the ultralow liquid flow rate through the device. The device is simple in structure, low in cost and capable of saving energy, the method for measuring the ultralow liquid flow rate can be applied to small chips, used in various shapes of pipelines as well and even used in open channels.

Description

technical field [0001] The invention relates to the field of liquid flow rate measurement, in particular to a device and method for measuring ultra-low liquid flow rate. Background technique [0002] Velocity is an important parameter to reflect the flow of liquid. Velocity measurement plays an important role in industrial and agricultural production, national defense construction, trade and people's life. [0003] There are currently many methods for measuring flow velocity, and the main instruments used include electromagnetic flowmeters, ultrasonic flowmeters, thermal flowmeters, differential pressure flowmeters, turbine flowmeters and vortex flowmeters. None of these flowmeters can measure sufficiently low flow rates due to lack of sufficient sensitivity and long-term stability. In many semiconductor industries and chemical analysis, the flow rate of these liquids is very small. At present, photothermal effect and optical microbalance are used to realize the measurement...

AI Technical Summary

Problems solved by technology

The ultrasonic interference source is used to form the interference intensity at the position of the receiver. When the fluid flows between the interference source and the receiver, the voltage measured by the receiver is measured, and it is substituted into the standard curve determined by calculation or standard flow field calibration to calculate the fluid flow velocity. , the patented device has a complex structure and cumbersome data processing

[0005] Therefore, these current methods for measuring low flow rates have complex structures and require cumbersome data processing methods, while the measurement of low flow rates in open channels is still difficult to achieve

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