Device and method for measuring ultralow liquid flow rate

A liquid and flow rate technology, which is applied in the field of devices for measuring ultra-low liquid flow rates, can solve the problems of difficult realization of low flow rates, complicated device structure, cumbersome data processing methods, etc., and achieve the effect of avoiding signal processing

Active Publication Date: 2015-03-25
杭州路捷建材技术有限公司
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Problems solved by technology

The ultrasonic interference source is used to form the interference intensity at the position of the receiver. When the fluid flows between the interference source and the receiver, the voltage measured by the receiver is measured, and it is substituted into the standard curve determined by calculation or standard flow field calibration t

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  • Device and method for measuring ultralow liquid flow rate
  • Device and method for measuring ultralow liquid flow rate
  • Device and method for measuring ultralow liquid flow rate

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Embodiment Construction

[0032] The present invention provides a method for measuring ultra-low liquid flow rates. This method is suitable for developing flow rate measurement devices in a simple, low-cost, and energy-efficient manner. The method is based on the characteristics of the tungsten oxide electrode, the surface of the tungsten oxide electrode is composed of compact WO 3 Inner layer and slack WO 3 .xH 2 O outer layer composition, when the flow rate on the surface of the tungsten oxide electrode becomes larger, this layer of loose hydration layer is thinned, resulting in a change in the electrode potential of the tungsten oxide electrode, under the same solution temperature and pH value, by measuring the oxidation The open circuit voltage between the tungsten electrode and the reference electrode can be used to obtain the potential change of the tungsten oxide electrode itself, so as to measure the ultra-low liquid flow rate. Since the electrode potential of the tungsten oxide electrode is...

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Abstract

The invention discloses a device for measuring the ultralow liquid flow rate. The device comprises a liquid storage tank and a circulation pool, wherein the liquid storage tank and the circulation pool are connected through a pipeline to form a liquid circulation loop. A temperature sensor, a reference electrode and a pH glass electrode are placed in the liquid storage tank. A tungsten oxide electrode is placed in the circulation pool. An open-circuit voltage E1 detection unit is arranged between the tungsten oxide electrode and the reference electrode. An open-circuit voltage E2 detection unit is arranged between the reference electrode and the pH glass electrode. The device further comprises a processor used for calculating the ultralow flow rate of liquid according to E1, E2 and the temperature value T measured through the temperature sensor. The invention further discloses a method for measuring the ultralow liquid flow rate through the device. The device is simple in structure, low in cost and capable of saving energy, the method for measuring the ultralow liquid flow rate can be applied to small chips, used in various shapes of pipelines as well and even used in open channels.

Description

technical field [0001] The invention relates to the field of liquid flow rate measurement, in particular to a device and method for measuring ultra-low liquid flow rate. Background technique [0002] Velocity is an important parameter to reflect the flow of liquid. Velocity measurement plays an important role in industrial and agricultural production, national defense construction, trade and people's life. [0003] There are currently many methods for measuring flow velocity, and the main instruments used include electromagnetic flowmeters, ultrasonic flowmeters, thermal flowmeters, differential pressure flowmeters, turbine flowmeters and vortex flowmeters. None of these flowmeters can measure sufficiently low flow rates due to lack of sufficient sensitivity and long-term stability. In many semiconductor industries and chemical analysis, the flow rate of these liquids is very small. At present, photothermal effect and optical microbalance are used to realize the measurement...

Claims

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Application Information

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IPC IPC(8): G01P5/08G01P5/10
Inventor 文一章王晓萍
Owner 杭州路捷建材技术有限公司
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