The invention belongs to the surface patterning 
microstructure construction technique, which relates to a method for constructing a 
microstructure with anti-reflection performance on a foundation base by combining the self-
assembly technique with the 
reactive ion beam etching technique. The method is to take 
monolayer polymeric micro-spheres, 
silicon dioxide micro-spheres and nano-particles of 
metal or 
metal oxides as a 
barrier layer and implement the RIE 
etching to the foundation base, then an approximate cone-shaped 
microstructure is constructed on the foundation base, and the structure has extreme high anti-reflection performance, thereby effectively improving the 
light energy utilization rate, reducing the interference of veiling glare in an optical 
system, increasing the 
optical transmittance, and further improving the sensitivity and stability of the optical 
system, and the method can be used for constructing large-area anti-reflection structures. The method of the invention has advantages of simple operation, changeable foundation base, strong applicability, good 
repeatability, low cost, high efficiency, adjustable anti-reflective applied 
wavelength and conformity to industrialized standards, and can be used for making photoelectric devices such as solar batteries and 
white light sensors.