Method for manufacturing semi-floating gate device with planar channels
A semi-floating gate device and planar channel technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of metal gate damage and poor high temperature resistance of metal gate, so as to avoid damage, process The process is simple and the effect of improving performance
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[0038] The present invention will be further described in detail below with reference to the drawings and specific embodiments. In the figure, for the convenience of description, the thickness of the layers and regions are enlarged, and the size shown does not represent the actual size. The reference figure is a schematic diagram of an idealized embodiment of the present invention. The embodiment shown in the present invention should not be regarded as limited to the specific shape of the area shown in the figure, but includes the resulting shape, such as deviations caused by manufacturing. For example, the curves obtained by etching usually have the characteristics of bending or roundness, but in the embodiment of the present invention, they are all represented by rectangles. The representation in the figure is schematic, but this should not be considered as limiting the scope of the present invention. At the same time, in the following description, the term substrate used can...
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