Bi[0.85-x]Pr0.15AExFe0.97Mn0.03O3 ferroelectric film and preparation method thereof
A ferroelectric thin film, r-3m technology, applied in coatings and other directions, can solve the problems of weak magnetism, large coercive field, and high leakage current of the film, and achieve uniform doping, small coercive field, and low leakage current density Effect
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Embodiment 1
[0032] Step 1, dissolving bismuth nitrate, praseodymium nitrate, strontium nitrate, ferric nitrate and manganese nitrate in a solvent with a molar ratio of 0.88:0.15:0.02:0.97:0.03 (AE=Sr, x=0.02, bismuth nitrate excess 5%) , to obtain a stable Bi with a total metal ion concentration of 0.3 mol / L 0.83 PR 0.15 Sr 0.02 Fe 0.97 mn 0.03 o 3 Precursor solution; wherein the solvent is a mixed solution of ethylene glycol methyl ether and acetic anhydride with a volume ratio of 3:1;
[0033] Step 2: Select the FTO / glass substrate as the substrate, place the substrate in detergent, acetone, and ethanol in sequence, and clean it with ultrasonic waves for 10 minutes, then wash the substrate with distilled water and dry it with nitrogen; then place it in an oven at 60°C Baked in medium temperature for 5 minutes, then took it out and let it stand to room temperature; finally placed the substrate in a UV irradiator for 40 minutes to make the surface of the substrate reach "atomic clean...
Embodiment 2
[0043] Step 1, dissolving bismuth nitrate, praseodymium nitrate, strontium nitrate, iron nitrate and manganese nitrate in a solvent in a molar ratio of 0.87:0.15:0.03:0.97:0.03 (AE=Sr, x=0.03, bismuth nitrate excess 5%) , to obtain a stable Bi with a total metal ion concentration of 0.25mol / L 0.82 PR 0.15 Sr 0.03 Fe 0.97 mn 0.03 o 3Precursor solution; wherein the solvent is a mixed solution of ethylene glycol methyl ether and acetic anhydride with a volume ratio of 2.5:1;
[0044] Step 2: Select the FTO / glass substrate as the substrate, place the substrate in detergent, acetone, and ethanol in sequence, and clean it with ultrasonic waves for 10 minutes, then wash the substrate with distilled water and dry it with nitrogen; then place it in an oven at 60°C Baked for 5 minutes, then took it out and let it stand to room temperature; finally, placed the substrate in a UV irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness". Spin-coating B...
Embodiment 3
[0047] Step 1, dissolving bismuth nitrate, praseodymium nitrate, calcium nitrate, iron nitrate and manganese nitrate in a solvent in a molar ratio of 0.86:0.15:0.04:0.97:0.03 (AE=Ca, x=0.04, bismuth nitrate excess 5%) , to obtain a stable Bi with a total metal ion concentration of 0.35 mol / L 0.81 PR 0.15 Ca 0.04 Fe 0.97 mn 0.03 o 3 Precursor solution; wherein the solvent is a mixed solution of ethylene glycol methyl ether and acetic anhydride with a volume ratio of 3.5:1;
[0048] Step 2: Select the FTO / glass substrate as the substrate, place the substrate in detergent, acetone, and ethanol in sequence, and clean it with ultrasonic waves for 10 minutes, then wash the substrate with distilled water and dry it with nitrogen; then place it in an oven at 60°C Baked for 5 minutes, then took it out and let it stand to room temperature; finally, placed the substrate in a UV irradiator for 40 minutes to make the surface of the substrate reach "atomic cleanliness". Spin-coating B...
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