Detection method for aligning mask plate in optical alignment
A detection method and mask technology, which is applied to the original parts, optics, nonlinear optics and other directions for photomechanical processing, can solve the problems of mask displacement, wrong exposure direction, production line loss, etc., so as to avoid a large number of problems Loss, the effect of ensuring accuracy
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[0021] Below in conjunction with accompanying drawing and specific embodiment, further illustrate the present invention, should be understood that these embodiments are only for illustrating the present invention and are not intended to limit the scope of the present invention, after having read the present invention, those skilled in the art will understand various aspects of the present invention Modifications in equivalent forms all fall within the scope defined by the appended claims of this application.
[0022] The invention provides a method for detecting alignment of an optical alignment mask plate that can automatically alarm. When the exposure direction is incorrect, the machine will report an alarm and stop working, thereby avoiding a large amount of loss on the production line. The detection method is as follows: a photodetector 50 and an alarm device 60 connected with the photodetector 50 are installed on the exposure machine. A mask plate 10 is used to shield the...
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