Photoetching procedure dynamic scheduling method based on index forecasting and solution similarity analysis

Abstract

The invention discloses a photoetching procedure dynamic scheduling method based on index forecasting and solution similarity analysis and belongs to the fields of advanced manufacture, automation and information. The dynamic scheduling method aims at photoetching procedure dynamic scheduling on a semiconductor production line. The method includes the steps that a photoetching procedure dynamic scheduling problem is divided into an equipment selection scheduling sub-problem and a workpiece sequencing scheduling sub-problem, and a performance index forecasting model of the workpiece sequencing scheduling sub-problem is established on line; then, an original scheduling problem is solved by utilizing a differential evolution algorithm based on solution similarity analysis. In the differential evolution algorithm, the performance index forecasting model of the workpiece sequencing scheduling sub-problem is used for performing quick rough estimation on global scheduling performance of solutions of the equipment selection scheduling sub-problem. In the estimation process on the scheduling solutions, a mode of combining acute estimation and the rough estimation is adopted in the method to perform the performance estimation on solutions in the differential evolution algorithm; by using the dynamic scheduling method, the efficiency and the effect of photoetching procedure production and scheduling can be remarkably improved.

Description

technical field [0001] The invention belongs to the fields of advanced manufacturing, automation and information, and in particular relates to a dynamic scheduling method for lithography process oriented to semiconductor production line lithography process scheduling and based on index forecast and solution similarity analysis. Background technique [0002] The lithography process scheduling problem of the semiconductor production line aimed at by the present invention is a single process scheduling problem with the optimization target of the sum of the total weighted elapsed time, with machine adaptability constraints and sequence-related preparation time. The photolithography process is one of the key processes in the semiconductor production line, and its scheduling effect has a great impact on the production performance indicators of the entire production line. For this type of problem, existing scheduling methods mainly include precise optimization methods, classical ar...

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Problems solved by technology

However, the scheduling performance of the existing scheduling methods is still not ideal when dealing with the above-mentioned scheduling problems on a large scale. Therefore, it is of great significance to propose a dynamic scheduling method for lithography processes with better performance.

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