A cleaning method of a metal film forming mask

A metal film forming and masking technology, which is applied in the field of mask cleaning, can solve the problems of troublesome transportation of the mask, and achieve the effect of eliminating the inconvenience of transportation, improving the cleaning efficiency and simplifying the cleaning process.

Inactive Publication Date: 2015-05-13
TRULY HUIZHOU SMART DISPLAY
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  • Abstract
  • Description
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Problems solved by technology

However, since the transportation of large-sized mask

Method used

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  • A cleaning method of a metal film forming mask
  • A cleaning method of a metal film forming mask

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Embodiment Construction

[0018] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments. Referring to the embodiment of the present invention figure 1 As shown, in order to solve the problem of cleaning large-scale metal film-forming masks, the following methods are provided:

[0019] In the first step, the mask plate 1 is put into the organic matter evaporation chamber, and the material of the mask plate is invar36 (Invar alloy), but not limited thereto. Before the evaporation, the organic matter evaporation chamber is evacuated into a high vacuum, and a layer of organic material is evaporated on the entire surface of the mask plate 1 to form an organic layer 2 through a vacuum evaporation of 1 to 2 minutes. The organic layer 2 should be evaporated evenly, and its thickness should be light and thin on the basis of uniform evaporation, so as to prevent the organic layer 2 from being too thick and partially fall off in the later process. Th...

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Abstract

A cleaning method of a metal film forming mask is disclosed. The method includes following three steps: S1) forming an organic layer on the surface of a mask by evaporation deposition; S2) putting the mask with the organic layer obtained in the step S1 into a metal film forming cavity, and performing metal evaporation deposition; and S3) putting the mask obtained in the step S2) into an organic solution and cleaning. The method can allow the metal film forming mask to be cleaned in a cleaning machine applying organic solvents, effectively prevents inconvenience in transportation processes, and saves the cost of delivering the mask to outside to be cleaned.

Description

technical field [0001] The invention relates to a semiconductor component manufacturing technology, in particular to a mask plate cleaning method. Background technique [0002] During the evaporation process of large-sized OLED cathode metal materials, as the evaporation continues, a large amount of metal materials are accumulated on the mask. In order to worry that the accumulation amount is too large to come off and pollute the evaporation chamber, the mask plate needs to be cleaned regularly. Since the cleaning cycle of this mask is longer than that of organic matter in other masks, the current cleaning of metal film-forming masks uses special methods or special equipment. General enterprises are not equipped with this equipment, only special Owned by chemical manufacturers, it is generally cleaned by external manufacturers who specialize in cleaning metal materials. However, the transportation of large-sized masks is cumbersome and requires a certain amount of expense....

Claims

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Application Information

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IPC IPC(8): G03F1/82
CPCG03F1/82
Inventor 周扬川柯贤军吴俊雄冉应刚苏君海黄亚清李建华
Owner TRULY HUIZHOU SMART DISPLAY
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