A cleaning method of a metal film forming mask

Abstract

A cleaning method of a metal film forming mask is disclosed. The method includes following three steps: S1) forming an organic layer on the surface of a mask by evaporation deposition; S2) putting the mask with the organic layer obtained in the step S1 into a metal film forming cavity, and performing metal evaporation deposition; and S3) putting the mask obtained in the step S2) into an organic solution and cleaning. The method can allow the metal film forming mask to be cleaned in a cleaning machine applying organic solvents, effectively prevents inconvenience in transportation processes, and saves the cost of delivering the mask to outside to be cleaned.

Description

technical field [0001] The invention relates to a semiconductor component manufacturing technology, in particular to a mask plate cleaning method. Background technique [0002] During the evaporation process of large-sized OLED cathode metal materials, as the evaporation continues, a large amount of metal materials are accumulated on the mask. In order to worry that the accumulation amount is too large to come off and pollute the evaporation chamber, the mask plate needs to be cleaned regularly. Since the cleaning cycle of this mask is longer than that of organic matter in other masks, the current cleaning of metal film-forming masks uses special methods or special equipment. General enterprises are not equipped with this equipment, only special Owned by chemical manufacturers, it is generally cleaned by external manufacturers who specialize in cleaning metal materials. However, the transportation of large-sized masks is cumbersome and requires a certain amount of expense....

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Problems solved by technology

However, since the transportation of large-sized masks is cumbersome and requires a certain amount of cost

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