Resistive non-volatile memory device and manufacturing method thereof
A non-volatile, manufacturing method technology, applied in the direction of electric solid-state devices, circuits, electrical components, etc., can solve the problems of slow operation speed, poor data retention, and limit the development of flash memory, and achieve the best reliability effect
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[0029] Embodiments for practicing the invention are discussed in detail below. It will be appreciated that the embodiments provide many applicable inventive concepts, which can be implemented in wide variation. The specific embodiments discussed are merely intended to invent specific ways of using the embodiments and are not intended to limit the scope of the invention. In order to make the features of the present invention more comprehensible, the specific examples below are described in detail in conjunction with the accompanying drawings:
[0030] based on the following Figure 1A ~ Figure 1D A fabrication method of a resistive non-volatile memory device is disclosed. First, please refer to Figure 1A A substrate 102 is provided, and a lower electrode layer 104 , a resistance transition layer 106 and an upper electrode layer 108 are sequentially formed on the substrate 102 . Next, a first mask 110 is formed on the upper electrode layer 108 . Using the first mask 110 as ...
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