Method for Direct Growth of Carbon Nanotube Field Emission Cathode on Nickel-Containing Metal Substrate
A field emission cathode, metal substrate technology, applied in cold cathode manufacturing, discharge tube/lamp manufacturing, electrode system manufacturing, etc., can solve problems such as affecting life and vacuum performance, accelerating CNT film aging, and reducing device conductivity. To achieve the effect of enhanced bonding properties, improved mechanical properties, and improved stability
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Embodiment 1
[0029] like figure 1 Shown, carry out the method for directly growing carbon nanotube field emission cathode on nickel-containing metal substrate in this CVD reaction device, comprise the following steps:
[0030] (1) Ultrasonic cleaning of the nickel-containing metal substrate with alcohol, acetone, and deionized water. In this embodiment, the nickel-containing metal substrate is pure nickel;
[0031] (2) Anodize the nickel-containing metal substrate, choose an acidic solution, use the nickel-containing metal substrate as the positive electrode, use a corrosion-resistant conductor (Pt) as the negative electrode, and apply a fixed voltage of 1V between the two electrodes for 0.1-10 minutes. After chemical treatment, carry out alcohol, acetone, deionized water chemical and ultrasonic cleaning on the nickel-containing metal substrate;
[0032] (3) Set up the CVD reaction device, see figure 1 , and carry out chemical vapor phase reaction growth of carbon nanotubes to nickel-con...
Embodiment 2
[0034] A method for directly growing carbon nanotube field emission cathodes on a nickel-containing metal substrate in a CVD reaction device, comprising the following steps:
[0035] (1) Carry out alcohol, acetone, deionized water chemical and ultrasonic cleaning on the nickel-containing metal substrate. In this embodiment, the nickel-containing metal substrate is stainless steel;
[0036] (2) Anodize the nickel-containing metal substrate, choose an acidic solution, use the nickel-containing metal substrate as the positive electrode, use a corrosion-resistant conductor (Pt) as the negative electrode, and apply a fixed voltage of 50V between the two electrodes for 0.1-10 minutes. Ultrasonic cleaning of nickel-containing metal substrates with alcohol, acetone, and deionized water after chemical treatment;
[0037] (3) Set up the CVD reaction device, see figure 1 , and carry out chemical vapor phase reaction growth of carbon nanotubes to nickel-containing metal substrates in a C...
Embodiment 3
[0039] A method for directly growing carbon nanotube field emission cathodes on a nickel-containing metal substrate in a CVD reaction device, comprising the following steps:
[0040] (1) Carry out alcohol, acetone, deionized water chemical and ultrasonic cleaning on the nickel-containing metal substrate. In this embodiment, the nickel-containing metal substrate is Hastelloy;
[0041](2) Anodize the nickel-containing metal substrate, choose an acidic solution, use the nickel-containing metal substrate as the positive electrode, choose a corrosion-resistant conductor (Pt) as the negative electrode, and apply a fixed voltage of 100V between the two electrodes for 0.1-10 minutes. After chemical treatment, carry out alcohol, acetone, deionized water chemical and ultrasonic cleaning on the nickel-containing metal substrate;
[0042] (3) Set up the CVD reaction device, see figure 1 , and carry out chemical vapor phase reaction growth of carbon nanotubes to nickel-containing metal su...
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