GaN-based high-voltage direct-current LED insulation isolating process
An insulation isolation, high voltage DC technology, applied in electrical components, electrical solid devices, circuits, etc., can solve problems such as increased equipment cost, disadvantageous compression packaging material cost, complex process, etc., to reduce the injection current density and reduce the loss of light-emitting area. , The effect of smoothing the sidewall surface
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[0039] The present invention will be further described below in conjunction with specific drawings and embodiments.
[0040] In order to effectively improve the insulation and isolation performance between multiple LED sub-units, greatly improve production efficiency, ensure production yield, and improve the performance of high-voltage DC LEDs, the insulation and isolation process of the present invention includes the following steps:
[0041] a. Provide a sapphire substrate 5 grown with an epitaxial layer 20, and define the MESA pattern of the LED subunit 11 on the epitaxial layer 20;
[0042] like image 3 and Figure 4 As shown, the epitaxial layer 20 includes the μ-GaN layer 4 grown on the sapphire substrate 5, the N-GaN layer 3 grown on the μ-GaN layer 4, the N-GaN layer 3 grown on the N-GaN layer 3 The multi-quantum well 2 and the P-GaN layer 1 grown on the multi-quantum well 2.
[0043] In order to define the MESA pattern of the LED subunit 11 on the epitaxial layer ...
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