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A liquid control device for an immersion photolithography machine

A technology of liquid control and lithography machine, which is applied in the direction of photolithography exposure device, micro-lithography exposure equipment, etc., which can solve the problems of immersion liquid leakage and achieve the effect of improving the removal ability

Active Publication Date: 2017-01-18
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The invention provides a liquid control device for an immersion photolithography machine to solve the problem of leakage of immersion liquid when the immersion photolithography machine performs substrate edge exposure

Method used

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  • A liquid control device for an immersion photolithography machine
  • A liquid control device for an immersion photolithography machine
  • A liquid control device for an immersion photolithography machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] For the liquid control device 150 of the immersion lithography machine of the present invention, please refer to figure 2 , including a liquid maintaining device 200 and an auxiliary liquid maintaining device 300, specifically, the liquid maintaining device 200 is arranged between the last objective lens 131 and the substrate 161, and the auxiliary liquid maintaining device 300 is arranged between the substrate 161 and the substrate 161 between the substrate table 160, where,

[0054] Please focus on reference image 3 The liquid maintaining device 200 is arranged under the last objective lens 131, preferably, the distance between the liquid maintaining device 200 and the substrate 161 is 50 μm to 200 μm, that is, the substrate 161 The distance between the upper surface of the liquid retaining device 200 and the lower surface of the liquid maintaining device 200 is 50 μm˜200 μm. Specifically, the liquid maintaining device 200 includes a block 210, and the block 210 e...

Embodiment 2

[0085] Please focus on reference Figure 7 , The difference between this embodiment and Embodiment 1 is that: the first air cavity 311 is provided with a gas guide vane 370 . The gas is made to flow toward the edge of the substrate 161 in the direction of the gas guiding vanes 370 to prevent the impact force of the gas flow on the substrate 161 .

Embodiment 3

[0087] Please focus on reference Figure 8 The difference between this embodiment and embodiment 1 or embodiment 2 is that: the angle between the gas supply channel 310 and the vertical direction is 30°-60°. The gas enters the first air cavity 311 and the first gap 330 according to an inclination angle of 30°-60°, so as to flow toward the edge of the substrate 161 without breaking the vacuum of the adsorption device 162 at the bottom of the substrate 161 .

[0088] In summary, the liquid control device 150 of the immersion lithography machine provided by the present invention is applied in the immersion lithography machine, and includes the liquid maintenance device 200 and the auxiliary liquid maintenance device 300, wherein the liquid maintenance device 200 is set Below the last piece of objective lens 131, it includes a stopper 210, and the described stopper 210 surrounds a cavity 220, and the described stopper 210 is provided with: a horizontal liquid inlet 211, and the si...

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Abstract

The invention relates to a liquid control device of an immersion type lithography machine, which is applied to the immersion type lithography machine. The liquid control device comprises a liquid maintaining device and an assisted liquid maintaining device, the liquid maintaining device is arranged under the last objective lens and comprises a check block, the check block can define a cavity matched with the last objective lens in shape, a horizontal liquid inlet, a horizontal liquid outlet, a vertical liquid inlet and a vertical extraction opening are formed on the check block, the horizontal liquid inlet corresponds to the side edge of the last objective lens in position, the horizontal liquid outlet and the horizontal liquid inlet are symmetrically arranged, the vertical liquid inlet penetrates into the bottom of the check block, the vertical extraction opening penetrates into the bottom of the check block, and a distance from the vertical extraction opening to the center of the cavity is more than a distance from the vertical liquid inlet to the center of the cavity; the assisted liquid maintaining device is arranged between a substrate and a substrate base for bearing the substrate, covers the substrate base and comprises a gas supplying channel communicated with a first gas cavity, a vacuum supplying channel communicated with a second gas cavity, and the first gas cavity and the second gas cavity re communicated by a first gap. The liquid control device of the immersion type lithography machine can effectively prevent immersion liquid from leakage.

Description

technical field [0001] The invention relates to the field of photolithography equipment, in particular to a liquid control device for an immersion photolithography machine. Background technique [0002] Modern semiconductor integrated circuit manufacturing is based on optical lithography equipment, which uses an optical system to accurately project the integrated circuit pattern on the mask onto the target area of ​​the silicon wafer. Lithographic equipment generally includes a light source system, an objective lens system, a mask table system, an alignment system, a workpiece table system, etc. For example, a lithographic equipment can be used in the manufacture of integrated circuits. In this case, a patterning device, which may be called a mask, a reticle, can be used to create a circuit pattern to be formed on a single layer of an integrated circuit, which pattern can be transferred to a target portion on a substrate (e.g., a silicon wafer) (eg, comprising a portion, a ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 张崇明聂宏飞杨志斌张洪博赵丹平赵旭
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD