Manufacturing method for silane type product

A manufacturing method and silane technology, applied in the direction of silicon hydride, etc., to achieve the effect of eliminating the risk of chlorine and halogen

Inactive Publication Date: 2015-06-24
上海万寅安全环保科技有限公司 +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As we all know, in electronic components, chlorine is the most feared element, even if it exist

Method used

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  • Manufacturing method for silane type product
  • Manufacturing method for silane type product
  • Manufacturing method for silane type product

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Carry out steps A, B, C, D, E according to the above method. Wherein, the catalyst used in step B is a mixture of zinc salt and rhodium salt; the separation in step C is to sequentially separate silyl propane, silyl ethane and silyl methane by cooling down. First, the silane mixed gas was cooled to -120°C to separate silylpropane; then the temperature was lowered to -170°C to separate silane ethane; and then the temperature was lowered to -240°C to separate silylmethane. Thus, silamethane, silaethane, and silapropane are all present in the liquid phase.

[0053] After all kinds of silane products are produced, they need to undergo precision purification operations to meet the high-precision purity of high-tech electronic products. The gas phase is formed, and then the temperature is lowered to obtain silicon methane at a temperature of -220°C. Therefore, impurities that are not at this temperature will be removed to improve the purity. In the same way, the silane is h...

Embodiment 2

[0055] Repeat Example 1, the difference is that the catalyst used in step B is zinc salt; in step C, the silane-based mixed gas is cooled to -60 ° C, and silyl propane is separated; Then the temperature was lowered to -170°C, and the silylmethane was separated. In the purification operation, the silamethane is further cooled to -180°C, the silane ethane is further cooled to -130°C, and the silapropane is further cooled to -70°C.

Embodiment 3

[0057] Repeat Example 1, the difference is that the catalyst used in step B is platinum salt; in step C, the silane-based mixed gas is cooled to -90°C to separate out silapropane; and then cooled to -145°C to separate out silane ethane: Then the temperature was lowered to -205°C, and the silylmethane was separated. In the purification operation, the silamethane is cooled to -200°C again, the silane ethane is further cooled to -145°C, and the silapropane is further cooled to -90°C.

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PUM

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Abstract

The invention provides a manufacturing method for a silane type product. The manufacturing method for the silane type product comprises the following steps: A, preparing magnesium silicide from silica powder and magnesium powder in the presence of a catalyst; B, enabling the magnesium silicide and ammonia chloride to react to generate silane type gas and hexammoniated magnesium chloride in the presence of liquid ammonia and the catalyst; C, performing a separation reaction on the hexammoniated magnesium chloride to obtain magnesium chloride and liquid ammonia; D, performing electrolysis on the magnesium chloride to obtain magnesium powder and chlorine gas; E, performing a reaction on the chlorine gas obtained in the step D and the liquid ammonia obtained in the step C to generate ammonia chloride, and applying the obtained ammonia chloride to the step B. The manufacturing method for the silane type product is completely completed under a chloride-free and halogen-free environment; the risk of chloride and halogen in the subsequent use can be fully eliminated; furthermore, all side-products and intermediate products can be recovered and reutilized, so that the top requirement of environment protection is achieved.

Description

technical field [0001] The invention belongs to the technical field of manufacturing silane products, in particular to a method for manufacturing silane products in which by-products are recovered and reused in a comprehensive process. Background technique [0002] In the manufacturing process of microelectronics, silicon is used to isolate the conductive layers in electronic precision components. Since components, such as chips, are pursuing precision repeatedly, and the specification design is getting finer and finer, from micron to nanometer, so the silicon isolation layer can no longer be cut and formed by mechanical means, but must be formed by gas phase lamination, so silane The use forms necessary materials. [0003] There are at least two traditional methods for preparing silane. One is the silicon-magnesium method, or the Komatsu method, using silicon powder and magnesium powder as initial materials to synthesize magnesium silicide, Si+2Mg----→Mg 2 Si. Then reac...

Claims

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Application Information

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IPC IPC(8): C01B33/04
Inventor 谢嵩嶽
Owner 上海万寅安全环保科技有限公司
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