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An all-metal anti-reflection system based on two-dimensional grating structure

A two-dimensional grating, all-metal technology, applied in the field of optoelectronics, to achieve the effect of improving performance, promoting development and improving optical performance

Inactive Publication Date: 2017-03-01
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, there is no effective solution that can improve the optical performance of the device without affecting the electrical properties of the metal film

Method used

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  • An all-metal anti-reflection system based on two-dimensional grating structure
  • An all-metal anti-reflection system based on two-dimensional grating structure
  • An all-metal anti-reflection system based on two-dimensional grating structure

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Embodiment Construction

[0017] The specific implementation of the present invention will be described in detail below in conjunction with the accompanying drawings: the case of this implementation is based on the all-metal anti-reflection system based on the two-dimensional grating structure proposed by the present invention, but the scope of protection of the present invention is not limited to the following embodiments with case.

[0018] Such as figure 1 As shown, an all-metal anti-reflection system based on a two-dimensional grating structure is an optoelectronic device including a two-dimensional grating structure (1), a metal thin film (2) and a transparent substrate (3). The two-dimensional disk-shaped grating structure is located on the metal film, and the material of the grating structure and the metal film is gold, wherein the period of the disk-shaped grating structure is 1400nm, the radius is 500nm, the height is 50nm, and the thickness of the metal film is 20nm.

[0019] The manufacturi...

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Abstract

The invention discloses an all-metal anti-reflection system based on a two-dimensional grating structure. In the field of photoelectrons, a metal thin film is usually required to be plated on the surface of a device to serve as an electrode or increase the electrical conductivity, low transmittance and high reflectance of the metal thin film to incident light enable very little incident light to reach the device, so that the performance of the device is influenced. According to the all-metal anti-reflection system, the anti-reflection system with an all-metal structure is firstly provided, a two-dimensional grating structure is made on the surface of the metal thin film to excite surface plasmon polariton of the surface of the metal thin film, so that the anti-reflection function of multiple times of specific incident wavelength is realized, the performance of the device is greatly improved, and a great function of promoting the development of a photoelectron technology is achieved.

Description

technical field [0001] The invention belongs to the field of optoelectronics, in particular to an all-metal antireflection system based on a two-dimensional grating structure. Background technique [0002] In the field of optoelectronics, the surface of the device often needs to be coated with a layer of metal film as an electrode or to increase conductivity. This technology is widely used in solar cells, electron microscope detection, micro-nano processing and other fields. However, the low transmittance and high reflectivity of the metal thin film itself to incident light make a very small amount of incident light reach the device itself, affecting the performance of the device itself. The traditional method is to coat a layer of dielectric film and use the principle of multi-beam interference to increase the light transmittance of metal thin films, but the dielectric film covering the surface changes the electrical properties of the original metal surface. At present, th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/11
CPCG02B1/113
Inventor 曲俞睿李强仇旻
Owner ZHEJIANG UNIV
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