Fin field effect transistor with multi-layer fin for multi-value logic applications and method of forming the same
A fin and underlying technology, applied in the field of fin field effect transistor technology nodes, can solve the problems of complex and expensive transistors
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[0040] The following description is for purposes of explanation and numerous specific details are set forth in order to provide an understanding of the example embodiments. It should be apparent, however, that example embodiments may be practiced without these specific details or with an equivalent arrangement. In other instances, well-known structures and devices are shown in block diagram form in order to avoid unnecessarily obscuring the embodiments. Furthermore, all numbers expressed in the specification and claims, such as amounts, ratios and numerical characteristics of ingredients, reaction conditions, etc., are in any case modified by the term "about" unless otherwise stated.
[0041] The present invention addresses and solves the current problem of large footprint required to form a multi-valued logic transistor. According to embodiments of the present invention, multiple threshold voltages (Vt) can be achieved by forming multilayered fins with increasing germanium o...
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