Sunscreen silica gel for scars and preparation method thereof
A silicone gel and scar technology, applied in the field of biomedicine, can solve the problems of sunscreen and skin care products that have not yet been reported, and achieve the effect of simple production process, favorable protection and treatment, and low cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0027] Sunscreen silicone gel for scars, made of the following ingredients: Viscosity 5mm 2 / s Dimethicone 12%, Titanium Dioxide 8%, Butyl Methoxydibenzoylmethane 2%, Octocrylene 4%, Cetearyl Alcohol 2%, Caprylic Triglyceride 3%, Tea Extract 4%, Aloe Barbadensis Leaf Extract 5%, Ascorbyl Glucoside 3%, Butylene Glycol 5%, Tocopherol 1%, Water 51%.
Embodiment 2
[0029] Sunscreen silicone gel for scars, made from the following ingredients: Viscosity 20mm 2 / s Dimethicone 10%, Titanium Dioxide 5%, Butyl Methoxydibenzoylmethane 5%, Octocrylene 1%, Cetearyl Alcohol 0.5%, Caprylic Triglyceride 1%, Tea extract 5%, Aloe vera leaf extract 5%, Butanediol 5%, Tocopherol 5%, Ascorbyl Glucoside 1%, Water 56.5%.
Embodiment 3
[0031] Sunscreen silicone gel for scars, made from the following ingredients: Viscosity 50mm 2 / s Dimethicone 15%, Titanium Dioxide 10%, Butyl Methoxydibenzoylmethane 5%, Octocrylene 5%, Cetearyl Alcohol 5%, Caprylic Triglyceride 5%, Tea Extract 1%, Aloe Barbadensis Leaf Extract 1%, Ascorbyl Glucoside 5%, Butylene Glycol 5%, Tocopherol 5%, Water 38%.
PUM
Property | Measurement | Unit |
---|---|---|
Viscosity | aaaaa | aaaaa |
Viscosity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com