Unlock instant, AI-driven research and patent intelligence for your innovation.

Sm and nanometer Mo contained chip-stacking interconnection material

A technology for interconnection materials and chip stacking, applied in electrical components, electrical solid devices, circuits, etc., can solve problems such as fatigue failure and lack of reports, and achieve the effect of improving reliability, high service life, and meeting high reliability requirements

Inactive Publication Date: 2015-12-09
XUZHOU NORMAL UNIVERSITY
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, intermetallic compounds also have their own disadvantages: (1) In the process of instantaneous liquid phase bonding, due to solid-liquid interdiffusion to form intermetallic compounds accompanied by volume shrinkage, there are obvious voids inside the solder joints, and the existence of voids will cause become the source of crack initiation during the service of solder joints; (2) during the service period, along with the "on-off" of electronic products, electronic devices are subjected to alternating temperature loads, because of the mismatch of linear expansion coefficients between packaging materials, solder The point is easy to become a stress concentration area, and when the stress value reaches a certain level, the solder joint will fail due to fatigue
The reliability of the three-dimensional packaging structure can be significantly improved by studying new interconnect materials, but there is currently a lack of relevant reports in the international community on research in this area

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sm and nanometer Mo contained chip-stacking interconnection material
  • Sm and nanometer Mo contained chip-stacking interconnection material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] A chip stack interconnection material containing Sm and nano-Mo consists of 0.5% rare earth element Sm, 8% nano-Mo particles, and the balance being In.

[0020] The service life of the high-strength solder joint formed after bonding (260℃, 10MPa) is about 4450 thermal cycles (taking into account the test error), and the paste interconnect material has excellent solderability.

Embodiment 2

[0022] A chip stack interconnection material containing Sm and nano-Mo consists of 0.5% rare earth element Sm, 8% nano-Mo particles, and the balance being In.

[0023] The service life of the high-strength solder joint formed after bonding (260℃, 10MPa) is about 3500 thermal cycles (taking into account the test error), and the paste interconnect material has excellent solderability.

Embodiment 3

[0025] The composition of a chip stack interconnection material containing Sm and nano-Mo is: rare earth element Sm 0.02%, nano-Mo particles 4%, and the balance is In.

[0026] The service life of the high-strength solder joints formed after bonding (220℃, 7MPa) is about 3700 thermal cycles (taking into account the test error), and the paste interconnect material has excellent solderability.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an Sm and nanometer Mo contained chip-stacking interconnection material, and belongs to the field of the chip interconnection material. The content of the rare earth element Sm in the interconnection material is 0.01-0.5%, the content of the nanometer Mo particles is 3-8%, and the balance is In. Firstly, In-Sm intermediate alloy powder is prepared by mechanical grinding; then the In-Sm powder, the In powder, mixed rosin resin, a thixotropic agent, a stabilizing agent, an active aid and an active agent are mixed and fully stirred; finally, the nanometer Mo particles are added and fully stirred to prepare paste-shaped Sm and nanometer Mo particles contained interconnection material; salient points are manufactured on the surface of the chip by adopting a jet printing process; and the chip perpendicular interconnection in a three-dimensional space is realized at a certain pressure of (1MPa-10MPa) and at the temperature of (170-260 DEG C) so as to form high-strength interconnection welding points. The interconnection material is high in reliability and can be used in three-dimensional packaged chip stacking.

Description

Technical field [0001] The invention relates to a chip stack interconnection material containing Sm and nano-Mo, and belongs to the field of chip interconnection materials. The interconnect material is mainly used in the fields of high reliability requirements for three-dimensional packaging, and is a new type of interconnect material with high performance. Background technique [0002] For the development of the electronics industry, Moore's Law has always been considered to guide the development direction of electronic device technology, but the increasing integration of a single chip seems to make it difficult to continue to use Moore's Law. The emergence of three-dimensional packaging chip stacking technology can greatly postpone the failure time of Moore's Law, so the electronics industry has also entered the post-Moore era. Three-dimensional packaging, that is, the vertical stacking of chips in a three-dimensional space, can achieve the dual effects of reducing chip size a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/488
CPCH01L24/10H01L2224/10H01L2924/01042H01L2924/01049H01L2924/01062
Inventor 张亮范希营闵勇
Owner XUZHOU NORMAL UNIVERSITY