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Array substrate, manufacturing method thereof, and display device

An array substrate and substrate technology, which is applied in the manufacture of semiconductor/solid-state devices, semiconductor devices, electrical components, etc., can solve the problems of uneven surface of the array substrate, large angle difference, and increasing the difficulty of the alignment film process.

Active Publication Date: 2019-01-04
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the thin film transistors are only correspondingly arranged on a part of the array substrate, the surface of the array substrate formed in this way is uneven, and the angular difference is large, which will increase the process difficulty of the alignment film production.

Method used

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  • Array substrate, manufacturing method thereof, and display device
  • Array substrate, manufacturing method thereof, and display device
  • Array substrate, manufacturing method thereof, and display device

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Embodiment Construction

[0032] The specific implementation manners of the present invention will be further described below in conjunction with the drawings and examples. The following examples are only used to illustrate the technical solution of the present invention more clearly, but not to limit the protection scope of the present invention.

[0033] In a first aspect, the present invention provides an array substrate, which includes:

[0034] a substrate and a thin film transistor formed on the substrate;

[0035] a passivation layer formed over the thin film transistor;

[0036] Wherein, the thickness of the passivation layer in the thin film transistor region is smaller than that in other regions.

[0037] In a second aspect, the present invention provides a method for manufacturing an array substrate, which can be used for manufacturing the above-mentioned array substrate. The method includes: sequentially forming thin film transistors on the substrate, and forming a passivation layer on th...

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Abstract

The invention provides an array substrate and a manufacturing method thereof and a display device. The array substrate comprises a substrate, as well as a thin film transistor and a passivation layer which are formed on the substrate, wherein the passivation layer is positioned above the thin film transistor, and the thickness of the passivation layer in the thin film transistor region is smaller than that in a non thin film transistor region. In the array substrate, the thickness of the passivation layer in the thin film transistor region is smaller than that in other region, so that the flatness of the upper surface of the array substrate is improved and the process difficulty in manufacturing an alignment film can be reduced.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] With the development of display manufacturing technology, liquid crystal display technology has developed rapidly, and has replaced traditional picture tube displays and become the mainstream of future flat panel displays. In the field of liquid crystal display technology, TFT-LCD (Thin Film Transistor Liquid Crystal Display) is widely used in televisions, computers, etc. due to its large size, high integration, powerful functions, flexible process, and low cost. field. [0003] The thin film transistor liquid crystal display device includes an array substrate, a color filter substrate, and liquid crystal poured between the array substrate and the color filter substrate. In order to ensure that the liquid crystal molecules can be aligned in the correct direction and ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L21/77
Inventor 钱海蛟芮洲操彬彬黄寅虎
Owner BOE TECH GRP CO LTD