Indirect water cooling planetary transmission working stage

Abstract

The present invention discloses an indirect water cooling planetary transmission working stage which comprises a driving component, a transmission component and a planetary rotation seat which is circumferentially equipped with multiple planetary shafts. Each of the planetary shafts is equipped with a substrate table. The planetary rotation seat is equipped with a water through shaft which is provided with a water through cavity. A water inlet pipe which extends to the outside of a vacuum chamber is inserted in the water through cavity. The water through shaft is connected to the water outlet pipe which communicates with the water through cavity and extends to the outside of the vacuum chamber. The planetary rotation seat is provided with a water channel which communicates with the water inlet pipe and the water outlet pipe at each substrate table. The planetary transmission working stage has the advantages of simple and compact structure, low cost, high stability and reliability, and the improvement of etching uniformity.

Description

technical field [0001] The invention mainly relates to a water-cooling technology of a planetary transmission workpiece table in a semiconductor device, in particular to an indirect water-cooled planetary transmission workbench. Background technique [0002] Ion beam etching machine is a kind of high vacuum etching equipment. It adopts physical etching method and uses special ion source to generate ion beam. The accelerated ion beam realizes anisotropic etching on any material. There is a layer of mask on the surface of the workpiece. The material has a photolithographic pattern on it, the part of the mask material to be removed on the workpiece has been removed, and the ion beam bombards the part that is not covered by the mask material, mainly used for gold (Au), platinum (Pt) , NiCr alloy, copper (Cu) and other metal films for dry etching. [0003] During the process of etching the substrate by the ion beam, the temperature of the substrate table rises, and the temperatu...

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Problems solved by technology

[0003] During the process of etching the substrate by the ion beam, the temperature of the substrate table rises, and the temperature change will affect the uniformity of etching. In order to improve the uniformity of ion beam etching, the substrate table must be water-cooled ; The etching process must be carried out in a vacuum chamber. In the prior art, the water cooling of the workpiece table of the planetary transmission adopts a rotary seal (using the planetary shaft to pass through the water for water cooling). A total of four shafts need a rotary seal, which increases the load on the rotating motor and lengthens The reliability of the time running workpiece table is limited

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