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Hydrogen-oxygen synthesis apparatus and system for high-temperature oxidation furnace

A high-temperature oxidation and synthesis device technology, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of impacting equipment gas source cabinets, poor safety, and the impact of precision components, so as to facilitate temperature monitoring, easy monitoring, High safety effect

Active Publication Date: 2016-04-06
48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The hydrogen-oxygen synthesis device plays a key role in the hydrogen-oxygen synthesis process. Since the process gas contains flammable and explosive hydrogen, this puts forward high requirements for the safety of the hydrogen-oxygen synthesis device. The traditional quartz synthesis chamber of the hydrogen-oxygen synthesis device Placed outside the device, the safety is poor. The heat generated by the combustion of hydrogen and oxygen will impact the gas source cabinet of the equipment and affect the precision components in the gas source cabinet.

Method used

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  • Hydrogen-oxygen synthesis apparatus and system for high-temperature oxidation furnace
  • Hydrogen-oxygen synthesis apparatus and system for high-temperature oxidation furnace
  • Hydrogen-oxygen synthesis apparatus and system for high-temperature oxidation furnace

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Embodiment Construction

[0023] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0024] Figure 1 to Figure 4 An embodiment of the hydrogen-oxygen synthesis device used in the high temperature oxidation furnace of the present invention is shown, the hydrogen-oxygen synthesis device includes an ignition furnace 1, an ignition gun 2, a synthesis chamber 3 and a thermocouple group 4, and the main body of the synthesis chamber 3 is built-in In the ignition furnace 1, the gas outlet end of the synthesis chamber 3 extends to the outside of the ignition furnace 1 and communicates with the quartz tube; There is a hydrogen inlet pipe 5, an oxygen inlet pipe 6 is arranged at the inlet end of the synthesis chamber 3, and a thermocouple group 4 is installed on the ignition furnace 1 and the ignition gun 2. Compared with the traditional structure, the hydrogen-oxygen synthesis device adopts an external combustion structure, t...

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Abstract

The invention discloses a hydrogen-oxygen synthesis apparatus and system for a high-temperature oxidation furnace. The apparatus is composed of an ignition furnace, a burning torch, a synthesis chamber and a thermocouple group. A main body of the synthesis chamber is arranged inside the ignition furnace; and an air outlet end of the synthesis chamber extends out of the ignition furnace and is communicated with a quartz tube and an air inlet end of the synthesis chamber extends out of the ignition furnace and the burning torch sleeves the air inlet end. A hydrogen inlet pipe is arranged at an air inlet end of the burning torch; an oxygen inlet pipe is arranged at the air inlet end of the synthesis chamber; and the thermocouple group is installed on the ignition furnace and the burning torch in a split mode. In addition, the provided system consists of a controller, a temperature control module, a gas circuit module, a circuit board, and the hydrogen-oxygen synthesis apparatus for a high-temperature oxidation furnace; the temperature control module, the gas circuit module, and the circuit board are connected with the controller; the temperature control module and the thermocouple group are connected; and the gas circuit module is connected with the hydrogen inlet pipe and the oxygen inlet pipe. The hydrogen-oxygen synthesis apparatus and system have advantages of environment-friendly usage, high safety and reliability, and substantially improved process quality.

Description

technical field [0001] The invention mainly relates to an auxiliary device in an electronic semiconductor process, in particular to a hydrogen-oxygen synthesis device and system for a high-temperature oxidation furnace. Background technique [0002] In the manufacture of semiconductor devices, the wet oxygen process is commonly used, that is, using oxygen to carry high-temperature water vapor to grow a silicon dioxide film on a silicon substrate. In the wet oxygen process, the purity of high-temperature water vapor has an important impact on the process quality, and the purity of water vapor is not high, which will lead to high impurity content and poor film quality of the silicon dioxide film. In order to improve the purity of water, hydrogen and oxygen combustion (hydrogen-oxygen synthesis) is often used to produce high-purity water. [0003] Hydrogen-oxygen synthesis is at the tail of the quartz tube. Hydrogen and oxygen are burned to generate high-temperature water vapo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/02
CPCH01L21/02164H01L21/02238H01L21/02255H01L21/67017H01L21/67109
Inventor 陈晖苏卫中贾京英曹骞黄志海
Owner 48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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