Segment structure applicable to quasi-rectangular shield tunnels

A shield tunnel, quasi-rectangular technology, used in tunnels, tunnel linings, wellbore linings, etc., can solve the problems of extremely difficult construction control of surface settlement, unfavorable construction control of surface settlement, and difficult soil stabilization, and achieve good results. Arch effect, effect of reducing lining thickness, reducing bending moment and eccentricity

Active Publication Date: 2016-04-20
SHANGHAI TUNNEL ENG CO LTD +2
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are seagull-shaped grooves on the top of the double-circular tunnel, and the soil is not easy to stabilize, which is not conducive to the construction control of surface settlement. The deflection correction of the shield will aggravate the disturbance of the soil here, and it is easy to produce back soil to cause the surface to bulge. The construction control of the surface settlement extremely difficult
Secondly, the synchronous grouting holes of the double-circle tunnel are set at the upper and lower grooves of the center of the shield, and the path for the grout to fill the gap in the rear of the double-circle shield is relatively long. Failure to fill building voids in time will eventually lead to large ground deformation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Segment structure applicable to quasi-rectangular shield tunnels
  • Segment structure applicable to quasi-rectangular shield tunnels
  • Segment structure applicable to quasi-rectangular shield tunnels

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0023] Cooperate with reference figure 1 as shown, figure 1 It is a schematic diagram of the first cross-sectional form of the segment structure applicable to the rectangular shield tunnel of the present invention. The present invention is applicable to the segment structure 1 of a similar rectangular shield tunnel. The section of the segment structure 1 is in a rectangular shape. The vault arc segment 20 at the vault position of the section, and the two arch waist arc segments 30 at the arch waist positions on both sides of the section; the two arch waist arc segments 30 have the same radius and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a segment structure applicable to quasi-rectangular shield tunnels. The segment structure with the cross section being quasi-rectangular comprises an arch bottom arc section located at the arch bottom of the cross section, an arch crown arc section located at the arch crown of the cross section and two arch haunch arc sections located at the arch haunch positions on two sides of the cross section; the arch haunch arc sections are equal in radius which is smaller than the radius of the arch bottom arc section and the radius of the arch crown arc section; the arch bottom arc section is connected with both the arch haunch arc sections in smooth tangency, and the arch crown arc section is connected with both the arch haunch arc sections in smooth tangency. The segment structure has good arching effect, bending moment and eccentricity upon lining segments are reduced favorably, reinforcement consumption and lining thickness needed are reduced, and corresponding soil excavation volume and concrete consumption are less. In addition, shield equipment can cut soil mass on the whole section beneficially, and impact on surroundings is smaller.

Description

technical field [0001] The invention relates to the field of tunnel shield technology, in particular to a segment structure suitable for rectangular shield tunnels. Background technique [0002] In tunnel shielding, the current conventional tunnel sections are generally divided into single-hole single-line tunnels and single-hole-line double-line tunnels. Among them, single-hole single-line tunnels include small-diameter circular tunnels, and single-hole double-line tunnels include large-diameter circular tunnels. Double circular tunnel and rectangular tunnel. [0003] However, the line spacing of the double-line tunnel of the small-diameter circular tunnel is relatively large, the distance from the tunnel to the building is also large, the underground space occupied by the tunnel is also large, and the impact of shield tunneling on surrounding buildings is relatively large. Two tunnels need to be excavated at the same time, and the construction period is long. The excavat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): E21D11/08
CPCE21D11/08
Inventor 杨志豪管攀峰沈张勇张旭朱雁飞黄德中李刚董子博
Owner SHANGHAI TUNNEL ENG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products