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A mask plate and low refraction technology, applied in the field of exposure, can solve the problem of limited resolution of the mask plate, and achieve the effect of improving exposure accuracy and resolution

Active Publication Date: 2019-12-27
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention aims at the problem that the resolution of the existing mask plate is limited due to the influence of diffraction, and provides a mask plate that can achieve higher exposure accuracy and resolution

Method used

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Examples

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Comparison scheme
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Embodiment 1

[0024] Such as figure 2 , image 3 As shown, this embodiment provides a mask, which includes:

[0025] A graphic structure, which includes a light-shielding area 12 and a light-transmitting area 11;

[0026] The total reflection structure arranged on the light-emitting side of the graphic structure, the total reflection structure includes a high refraction layer 3 and a first low refraction layer 21 arranged in sequence and in contact with the direction away from the graphic structure, and the refractive index of the high refraction layer 3 is greater than that of the first low refraction layer. The refractive index of the refractive layer 21.

[0027] That is to say, the mask plate of this embodiment includes a conventional light-shielding region 12 and a light-transmitting region 11, wherein the light-shielding region 12 can block light, and the light-transmitting region 11 allows light to pass through, so that the pattern formed by the light-transmitting region 11 (The ...

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Abstract

The invention provides a mask, which belongs to the field of exposure technology, and can solve the problem that the resolution of the existing mask is limited due to the influence of diffraction. The mask plate of the present invention includes: a graphic structure, which includes a light-shielding area and a light-transmitting area; a total reflection structure arranged on the light-emitting side of the graphic structure, and the total reflection structure includes high-level structures arranged in sequence and in contact with each other in a direction away from the graphic structure. The refraction layer, the first low refraction layer, the refraction index of the high refraction layer is greater than the refraction index of the first low refraction layer.

Description

technical field [0001] The invention belongs to the field of exposure technology, and in particular relates to a mask plate. Background technique [0002] Many structures in display substrates, integrated circuits, etc. are prepared through a photolithography process, and exposure is an important step in the photolithography process, which is mainly performed through a mask. [0003] Such as figure 1 As shown, the mask includes a light-shielding area 12 and a light-transmitting area 11 , the light-shielding area 12 can block light, and the light-transmitting area 11 allows light to pass through. Therefore, when the exposure light (such as ultraviolet light) is vertically irradiated on the mask plate, it can only pass through the light-transmitting area 11 , thereby exposing the same area as the pattern of the light-transmitting area 11 to form a corresponding exposure pattern. With the development of technology, the structures in the display substrate and the like are gett...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/24
CPCG03F1/24G03F1/38G03F1/52G03F7/70283G03F7/70308G03F7/70325
Inventor 张朝波刘亮亮田宏伟白妮妮韩帅康峰唐亮绰洛鹏闵天圭
Owner BOE TECH GRP CO LTD