Check patentability & draft patents in minutes with Patsnap Eureka AI!

A Novel High Repetition Frequency Short Pulse ld Laser and Its Working Process

A high-repetition-frequency, short-pulse technology, applied in the field of new high-repetition-frequency short-pulse LD lasers and their working processes, can solve the problems of difficulty in increasing frequency and power at the same time, and difficulty in further reducing pulse width, so as to achieve high practical value and eliminate Interactive, easy-to-achieve effects

Active Publication Date: 2019-01-08
XI AN JIAOTONG UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Aiming at the problem that the frequency and power of the traditional laser pulse circuit are difficult to increase at the same time, and the pulse width is not easy to further reduce, the purpose of the present invention is to provide a new type of high repetition frequency short pulse LD laser and its working process. The present invention is based on the traditional RC charging circuit In the above, two power supplies are used to supply power under two signals, and high-speed analog switches, such as high-speed switch mos tubes, etc. are used. Under the premise of ensuring the power of the original solution remains unchanged, the frequency can be doubled and the pulse can be reduced. width and rise time, which improves the performance of the laser pulse emission circuit

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Novel High Repetition Frequency Short Pulse ld Laser and Its Working Process
  • A Novel High Repetition Frequency Short Pulse ld Laser and Its Working Process
  • A Novel High Repetition Frequency Short Pulse ld Laser and Its Working Process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] Now in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:

[0022] In this embodiment, on the basis of the original RC charging and discharging method, two power sources are introduced to jointly supply power. Under the condition that the pulse power remains unchanged, the frequency of the laser pulse is doubled.

[0023] Such as figure 1 As shown, a novel high-repetition-frequency short-pulse LD laser of the present invention includes a positive high-voltage power supply 1 and a negative high-voltage power supply 2. The positive pole of the positive high-voltage power supply 1 is a positive voltage, and the positive pole of the negative high-voltage power supply 2 is a negative voltage. The voltages of the two are equal The negative pole of the positive high-voltage power supply 1 is grounded, and the positive pole is connected to the positive plate of the first decoupling capacitor 3 and one end of the f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A new type of high-repetition-frequency short-pulse LD laser and its working process. The laser includes two positive and negative high-voltage power supplies of equal size, two pulse signals, two high-speed analog switches controlled by pulse signals, two clamping diodes, Two energy storage elements, two decoupling capacitors, two charging current-limiting resistors, one discharging current-limiting resistor and a laser diode; the working process is as follows: set the frequency of the control signal to be f, and the phase difference between the two signals is π; Under the action of the control signal, the two energy storage elements discharge alternately, with a discharge interval of T / 2, so that the laser tube emits laser pulses with a frequency of 2f. The invention doubles the frequency under the premise that the pulse power remains unchanged; multiple Switches, positive and negative high-voltage power supplies, and clamping diodes avoid the mutual influence between the two charging and discharging circuits; compared with traditional solutions, the performance indicators of the required components are basically unchanged and are easy to implement.

Description

technical field [0001] The invention belongs to the technical field of laser emission, and in particular relates to a novel high-repetition-frequency short-pulse LD laser and its working process. Background technique [0002] Semiconductor Laser (Semiconductor Laser), also known as Laser Diode (Laser Diode), referred to as LD, is a general term for devices such as optical oscillation and optical amplification that use electronic transitions in semiconductors to cause stimulated emission of photons to generate optical oscillations and optical amplification. [0003] Compared with other types of lasers, semiconductor lasers have the following advantages: high conversion efficiency; wide frequency range; convenient modulation; low driving power supply voltage. [0004] Semiconductor lasers are widely used in many fields. Semiconductor lasers are widely used in military fields such as laser communication, laser guidance and tracking, laser radar, laser ranging, laser weapon sim...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/042
CPCH01S5/042H01S5/0428
Inventor 郑强孙剑徐飞刘倩玉
Owner XI AN JIAOTONG UNIV
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More