Substrate cleaning method
A technology for substrates and cleaning water, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as poor cleaning, slow delivery of substrates 100, large drying capacity, etc., to avoid strips Effects of mura, accelerated cleaning speed, and improved transport speed
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[0042] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0043] see Figure 2-4 , the present invention provides a substrate cleaning method, comprising the following steps:
[0044] Step 1. Provide a substrate 10 , and clean the substrate 10 with an aqueous solution to remove pollutants on the substrate 10 .
[0045] Specifically, the substrate 10 may be a TFT substrate, an unfinished TFT substrate, or a plain glass substrate.
[0046] Step 2, providing a first drying device, the first drying device includes a transfer wheel (not shown) for transferring the substrate 10, and a traditional air knife device 40 for removing residual cleaning water on the substrate 10, the The traditional air knife device 40 includes a first air knife unit 51 corresponding to the top of the substrate 10 and a second ...
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