TFT backplane and manufacturing method thereof
A backplane and directly above technology, which is applied in the field of TFT backplane and its manufacturing, can solve the problems of affecting the display effect, the decrease of the aperture ratio of the display device, and the large layout area, so as to achieve the effect of increasing the area and increasing the capacity
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[0022] In order to further illustrate the technical means and functions adopted by the present invention to achieve the intended purpose of the invention, the present invention will be described in detail below in conjunction with the accompanying drawings and preferred embodiments.
[0023] figure 1 Shown is a schematic cross-sectional view of the TFT backplane of the present invention. Such as figure 1 As shown, the TFT backplane of the present invention includes from bottom to top: a substrate 300, a silicon nitride layer 301 on the substrate 300, a silicon oxide layer 302 on the silicon nitride layer 301, and polysilicon on the silicon oxide layer 302 layer 303, a gate insulating layer 304 (GI layer, GateInsulation Layer) on the polysilicon layer 303, a first metal layer 305 on the gate insulating layer 304, a capacitor insulating layer 306 (CI layer) on the first metal layer 305 Layer, Capacitance Insulation Layer), the second metal layer 307 on the capacitor insulating...
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