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Zinc oxide-based sintered body, zinc oxide-based sputtering target comprising the sintered body, and zinc oxide-based thin film obtained by sputtering the target

A zinc oxide-based, sintered body technology, applied in sputtering coating, vacuum evaporation coating, ion implantation coating, etc., can solve the problems of low thermal conductivity, easy cracking, unsuitable for high-speed recording, etc., and achieve high thermal penetration rate, the effect of improving thermal permeability

Active Publication Date: 2017-06-20
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] However, ZnS-SiO 2 As an insulating material, an expensive RF power supply is required, and since ZnS-SiO 2 The film contains sulfide, so there is a problem of corroding the adjacent metal layer (especially the Ag alloy reflective layer), and there is a problem that it is not suitable for high-speed recording due to low thermal conductivity.
[0013] The inventors have developed sputtering targets utilizing zinc oxide-based homologous compounds (see Patent Document 2) and tin oxide-based sputtering targets (see Patent Document 3), which do not contain sulfide but have the same properties as ZnS -SiO 2 Equivalent properties, but not high thermal conductivity
In addition, the sintered body based on zinc oxide also has the problem of easy cracking during the manufacturing process or sputtering

Method used

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  • Zinc oxide-based sintered body, zinc oxide-based sputtering target comprising the sintered body, and zinc oxide-based thin film obtained by sputtering the target

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] Weigh zinc oxide, gallium oxide (Ga 2 o 3 ) and each raw material powder of Cu (average particle diameter 10 μm) as metal M added to make it 94.9:5.0:0.1 (weight %), and then add carbon powder with an average particle diameter 1 μm so that it becomes 150 weight ppm relative to the total amount, and mixed with a dry ball mill for about 10 hours.

[0058] Next, 1000 g of the mixed raw material components were filled in a mold with a diameter of 170 mm, and the temperature was raised from room temperature at 5° C. / min while blowing argon (Ar) gas. Pressurize to 300kgf / cm in minutes 2 .

[0059] Then, 1000°C, pressure 300kgf / cm 2 The state is maintained for 2 hours, then the heating of the furnace is stopped, and the pressure is reduced to 300kgf / cm in 30 minutes 2 ~0kgf / cm 2 . The target taken out from the furnace was processed into a disc shape with a diameter of 152 mm and a thickness of 5 mm to obtain a sputtering target.

[0060] The produced target did not hav...

Embodiment 2

[0064] Weigh zinc oxide, aluminum oxide (Al 2 o 3 ) and each raw material powder of Co (average particle diameter 10 μm) as metal M added to make it 94:1:5 (weight %), and carbon powder with an average particle diameter 1 μm was added so that it was 500 wtppm relative to the total amount, and mixed with a dry ball mill for about 10 hours.

[0065] Next, 1000 g of the mixed raw material components were filled in a mold with a diameter of 170 mm, and the temperature was raised from room temperature at 5° C. / min while blowing argon (Ar) gas. Pressurize to 300kgf / cm in minutes 2 .

[0066] Then, 1000°C, pressure 300kgf / cm 2 The state is maintained for 2 hours, then the heating of the furnace is stopped, and the pressure is reduced to 300kgf / cm in 30 minutes 2 ~0kgf / cm 2 . The target taken out from the furnace was processed into a disc shape with a diameter of 152 mm and a thickness of 5 mm to obtain a sputtering target.

[0067] The produced target did not have problems su...

Embodiment 3

[0071] Weigh zinc oxide, gallium oxide (Ga 2 o 3 ) and each raw material powder of Ni (average particle diameter 10 μm) as metal M added to make it 77:4:19 (weight %), and carbon powder with an average particle diameter 1 μm was added so that it was 100 weight ppm relative to the total amount, and mixed with a dry ball mill for about 10 hours.

[0072] Next, 1000 g of the mixed raw material components were filled in a mold with a diameter of 170 mm, and the temperature was raised from room temperature at 5° C. / min while blowing argon (Ar) gas. Pressurize to 300kgf / cm in minutes 2 .

[0073] Then, 1000°C, pressure 300kgf / cm 2The state is maintained for 2 hours, then the heating of the furnace is stopped, and the pressure is reduced to 300kgf / cm in 30 minutes 2 ~0kgf / cm 2 . The target taken out from the furnace was processed into a disc shape with a diameter of 152 mm and a thickness of 5 mm to obtain a sputtering target.

[0074] The produced target did not have problem...

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Abstract

The present invention provides a zinc oxide-based sintered body, wherein zinc oxide (ZnO) is used as a main component, and gallium (Ga), aluminum (Al) or boron (B) is contained as an n-type dopant for zinc oxide, and contain 10 to 300 ppm by weight of carbon, and contain one or more selected from cobalt (Co), nickel (Ni), iron (Fe), copper (Cu), molybdenum (Mo), ruthenium (Ru), rhodium (Rh ), tungsten (W), iridium (Ir), gold (Au) metal element M, at least a part or all of the metal M remains in the sintered body in the form of metal, relative to the zinc, n The concentration of the metal M of the type dopant and all metal elements is adjusted to be 0.05 to 25.0 atomic %. The present invention also provides a sputtering target including the sintered body and a thin film obtained by sputtering with the target.

Description

technical field [0001] The present invention relates to a zinc oxide-based sintered body mainly composed of zinc oxide, a zinc oxide-based sputtering target comprising the sintered body, and a zinc oxide-based film obtained by sputtering the target. Background technique [0002] In recent years, high-density recording optical disc technology, which is a high-density optical information recording medium that can be rewritable without a magnetic head, has been developed and rapidly commercialized. In particular, CD-RW was launched in 1977 as a rewritable CD, and is currently the most popular phase-change CD. The number of erasing and writing of this CD-RW is about 1000 times. [0003] In addition, DVD-RW has been developed and commercialized as DVD, and the layer structure of this optical disc is basically the same as or similar to that of CD-RW. The number of times of erasing and writing is about 1000 to about 10000 times. [0004] These optical discs are electronic compon...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C04B35/453C22C1/05C22C29/12
CPCC04B35/453C22C29/12C23C14/086C23C14/3414C22C1/051C04B2235/3217C04B2235/3256C04B2235/3258C04B2235/3272C04B2235/3275C04B2235/3279C04B2235/3281C04B2235/3286C04B2235/3289C04B2235/3409C04B2235/40C04B2235/402C04B2235/404C04B2235/405C04B2235/407C04B2235/408C04B2235/5436C04B2235/721
Inventor 高见英生奈良淳史
Owner JX NIPPON MINING & METALS CORP
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