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Monomer, polymer, organic layer composition, organic layer and method for forming pattern

A polymer and monomer technology, applied in the direction of organic chemistry, photoengraving process of pattern surface, coating, etc., can solve problems such as difficulty in providing fine patterns

Active Publication Date: 2019-05-21
SAMSUNG SDI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Today, depending on the small size of the pattern to be formed, it is difficult to provide a fine pattern with an excellent profile only by the above-mentioned typical photolithography techniques

Method used

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  • Monomer, polymer, organic layer composition, organic layer and method for forming pattern
  • Monomer, polymer, organic layer composition, organic layer and method for forming pattern
  • Monomer, polymer, organic layer composition, organic layer and method for forming pattern

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0131] Substituent introduction reaction

[0132] A mixed solution of 34 g (0.1345 mol) of naphthalene-2.6-dicarbonyl dichloride, 62.4 g (0.269 mol) of methoxypyrene, and 496 g of 1,2-dichloroethane / chloroform was placed in the flask. Next, 35.8 g (0.269 mol) of aluminum chloride was slowly added to the solution, and the resulting mixture was stirred at room temperature for 12 hours. When the reaction was complete, methanol was added thereto and the precipitate generated therein was filtered and dried.

[0133] Addition reaction

[0134] 6.4 g (10 mmol) of the compound obtained from the reaction and 285 g of tetrahydrofuran were placed in a flask, 20 ml (40 mol) of benzylmagnesium chloride (2.0 M in THF) was slowly added thereto at 0° C., and the mixture was heated to room temperature and stirred for 24 hours. When the reaction was completed, the resultant was neutralized with 5% hydrochloric acid solution to around pH 7, and then extracted with ethyl acetate and dried to o...

Synthetic example 2

[0138] Substituent introduction reaction

[0139] According to the same method as Synthetic Example 1, 28 g (0.1 mol) of benzoperylene, 46 g (0.21 mol) of 6-methoxy-2-naphthoyl chloride, 29 g (0.22 mol) of aluminum chloride and 707 g of dichloromethane were reacted .

[0140] Addition reaction

[0141] According to the same method as in Synthesis Example 1, using 6.4 g (10 mmol) of the compound obtained from the reaction and 12.5 ml (25 mmol) of isopropylmagnesium chloride (2.0 M in THF), the compound represented by Chemical Formula B was obtained.

[0142] [chemical formula B]

[0143]

Synthetic example 3

[0145] Substituent introduction reaction

[0146] Put 20.2g (0.1mol) terephthaloyl dichloride, 11.6g (0.05mol) 4-methoxypyrene, 7.9g (0.05mol) methoxynaphthalene and 157g 1,2-dichloroethane in the flask . Next, 13.2 g (0.1 mol) of aluminum chloride was slowly added to the solution, and the mixture was stirred at room temperature. The reaction was complete when the weight average molecular weight of samples taken from the polymerization reactants every hour was in the range of 1,200 to 1,500. When the reaction was completed, a precipitate generated by adding methanol thereto was filtered, and monomers remaining therein were removed with water and methanol, obtaining a polymer represented by Chemical Formula C (Mw: 1500).

[0147] [chemical formula C]

[0148]

[0149] Addition reaction

[0150] 7 g of the compound obtained from the reaction and 285 g of tetrahydrofuran were placed in a flask, 20 ml (40 mol) of benzylmagnesium chloride (2.0 M in THF) was slowly added ther...

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Abstract

A monomer, a polymer, an organic layer composition, an organic layer and associated methods, the monomer being represented by Chemical Formula 1:

Description

[0001] This application claims Korean Patent Application No. 10-2014-0164607 filed in KIPO on November 24, 2014 and Korean Patent Application No. 10-2015 filed in KIPO on Jul. 31, 2015 - Priority and benefit of Patent Application No. 0109027, the entire contents of which are incorporated herein by reference. technical field [0002] The present invention discloses novel monomers and polymers. The present invention discloses an organic layer composition comprising a compound (ie, a monomer, a polymer, or a combination thereof) for an organic layer, an organic layer manufactured from the organic layer composition, and a method of forming a pattern using the organic layer composition. Background technique [0003] Recently, the semiconductor industry has developed ultra-fine technology with patterns of several nanometers to tens of nanometers in size. This ultra-fine technology mainly requires efficient photolithography. Typical photolithography techniques include: providing ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07C43/23C07C49/84C08G61/12C08G61/04G03F7/00
CPCC07C43/23C07C2603/50C07C2603/52C08G61/02C08G2261/1422C08G2261/1424C08G2261/312C08G2261/314C08G2261/3424C08G2261/362C08G2261/45C08G2261/72C09D165/00
Inventor 南沇希权孝英金瑆焕金昇炫南宫烂豆米尼阿·拉特维文秀贤郑瑟基郑铉日许柳美
Owner SAMSUNG SDI CO LTD