Process for producing polycrystalline silicon
A polysilicon, polysilicon block technology, applied in chemical instruments and methods, silicon, silicon compounds, etc.
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[0020] Polycrystalline silicon is preferably deposited on heated thin silicon rods using silicon-containing components and hydrogen as reaction gases (Siemens method). The silicon-containing component is preferably chlorosilane, more preferably trichlorosilane. The deposition is carried out according to the prior art, for example with reference to WO2009 / 047107A2.
[0021] After deposition, the polycrystalline silicon rods are crushed. Preferably, the polycrystalline silicon rods are initially pulverized first. For this pre-shredding, hammers made of low-abrasive materials such as hard metals are used. The pre-shredding takes place on a bench with a surface preferably composed of low-abrasive plastic or silicon.
[0022] The pre-crushed polysilicon is then crushed to a desired target block size of 0, 1, 2, 3 or 4. The block size is defined as the maximum distance (=maximum length) between two points on the surface of the silicon block as follows:
[0023] Block size 0 in ...
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