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A fast finishing method for m2 type single crystal silicon

A single crystal silicon and single crystal technology, which is applied in the field of finishing of single crystal silicon rods with a specific diameter, can solve the problems of long finishing length, operation errors, and large amount of single crystal material, so as to improve production efficiency and production capacity, reduce dosage and The effect of energy consumption and single crystal quality compliance

Active Publication Date: 2018-02-13
XINGTAI JINGLONG ELECTRONICS MATERIAL
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  • Abstract
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AI Technical Summary

Problems solved by technology

[0003] M2-type monocrystalline silicon is a general term for single crystals with a diameter of 204mm. Due to its large diameter, the existing technology has a long finishing length, takes a lot of time to finish, and consumes a large amount of single crystal materials.
The length of the end is long, which is prone to operating errors. The long time consumption makes the production capacity of the single crystal furnace low, consumes a lot of energy, and consumes a large amount of single crystal raw materials, which eventually leads to higher production costs of M2 type single crystal.

Method used

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  • A fast finishing method for m2 type single crystal silicon

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Embodiment 1

[0016] An M2-type single crystal silicon finishing method, which is grown with a CZ-90 single crystal furnace produced by Hebei Jinglong Sunshine Equipment Co., Ltd., equipped with a PLC automatic control system for single crystal silicon growth, and the temperature calibration rate is 1 The parameters of the PLC automatic control system for crystal silicon growth are used to control the temperature in the single crystal furnace. The larger the temperature calibration rate setting value is, the more the temperature rises in the single crystal furnace. The temperature calibration rate satisfies the following relationship:

[0017] The temperature calibration setting value is x, and every 1 minute, the heating power of the single crystal furnace will increase by y, y=x×2.5 (w).

[0018] After the length of the single crystal is pulled to the specified length, it enters the finishing process, stops the crucible to rise, and the single crystal rising speed is set to 1.00mm / min. Th...

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Abstract

The invention relates to the technical field of monocrystalline silicon stick growth of by adopting a single crystal furnace pulling-method, in particular to a specific-diameter monocrystalline silicon stick ending method and particularly discloses a rapid ending method.By improving single crystal rise pulling speed, temperature correction rate and other ending parameters, the ending process is divided into three processes of 0-3 mm, 3-80 mm, 81-100 mm according to the ending length.The rapid M2-type monocrystalline silicon ending method can make the ending length of M2-type monocrystalline silicon sticks shortened to be 100 mm, the ending time is shortened by 0.5 hours, the raw material usage amount and energy consumption are reduced, the production efficiency and yield are improved and the production costs of M2-type monocrystalline silicon are reduced.

Description

technical field [0001] The invention relates to the technical field of growing single crystal silicon rods by a single crystal furnace pulling method, in particular to a finishing method for single crystal silicon rods with a specific diameter. Background technique [0002] The production process of preparing monocrystalline silicon by pulling method includes the following steps: furnace dismantling - charging - melting material - narrowing neck - shoulder setting - shoulder turning - equal diameter - finishing - shutdown. Among them, finishing is an important process. When the length of the single crystal reaches a certain length, dislocations of the single crystal can be better eliminated through finishing, the yield of single crystal can be improved, and the utilization rate of raw materials can be maximized. In general, the shape of the end section is required to be as long as one diameter of the single crystal and the cross-section is not greater than 30mm, the end time...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B15/20C30B29/06
CPCC30B15/20C30B15/206C30B29/06
Inventor 王会敏何京辉曹祥瑞颜超程志范晓甫周子江赵贝刘钦陈二星
Owner XINGTAI JINGLONG ELECTRONICS MATERIAL