Spacer, spacer manufacturing method, mask and display device
A manufacturing method and spacer technology, which are applied in nonlinear optics, instruments, optics, etc., can solve problems such as poor thickness uniformity of liquid crystal cells, high contact surface pressure, and blurred display images, so as to improve display quality and increase Large area and better thickness uniformity
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[0031] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0032] figure 1 It is a flow chart of a spacer manufacturing method provided by an embodiment of the present invention, see figure 1 , the method includes:
[0033] Step 101: Coating a photoresist material on a substrate to form a photoresist layer.
[0034] Step 102: exposing the photoresist layer using a mask.
[0035] Wherein, pattern area and non-pattern area are arranged on the mask plate; when the photoresist material is a negative photoresist material, the transmittance of the pattern area increases from the center to the edge; when the photoresist material is a positive photoresist material , the transmittance of the pattern area decreases from the center to the edge.
[0036] Wherein, the pattern area is used to form space...
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