Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for preparing a color filter substrate, a color filter substrate, and related devices

A technology for color filter substrate and substrate substrate, which is applied to instruments, nonlinear optics, optics, etc., can solve problems such as increased difficulty in process control, changes in color photoresist layers, and changes in display panel chromaticity, and reduces process control. effect of difficulty

Active Publication Date: 2019-07-02
BOE TECH GRP CO LTD +1
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Embodiments of the present invention provide a method for preparing a color filter substrate, a color filter substrate, a liquid crystal display panel, and a display device, so as to solve the problem of adjusting the height of the main spacer and the secondary spacer according to actual needs in the prior art. The color change of the display panel caused by the change of the thickness of the color photoresist layer and the difficulty of process control increase

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for preparing a color filter substrate, a color filter substrate, and related devices
  • A method for preparing a color filter substrate, a color filter substrate, and related devices
  • A method for preparing a color filter substrate, a color filter substrate, and related devices

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0027] The embodiment of the present invention provides a method for preparing a color filter substrate, such as figure 1 shown, including the following steps:

[0028] S101, sequentially forming patterns of at least three color photoresist layers on the base substrate; wherein, there are at least two color photoresist layers in the preset area, and the color photoresist layer close to the base substrate in the preset area is the first A photoresist layer, the thickness of the first photoresist layer in the preset area is higher than the thickness of the first photoresist layer in other areas except the preset area;

[0029] S102. After forming the pattern of each color photoresist layer, it also includes: performing thermal baking treatment on the pattern of each color photoresist layer, and the color photoresist layer in the preset area forms a spacer; and forming a spacer after the thermal baking treatment The height of the spacer is positively correlated with the overlapp...

Embodiment 1

[0044] When the number of layers of the color photoresist layer in the first preset area is equal to the number of layers of the color photoresist layer in the second preset area, the first preset area and the second preset area respectively include two layers of color photoresist layers Take this as an example.

[0045] The manufacturing process of the color filter substrate may specifically include the following steps:

[0046] (1) Form the pattern of the first color photoresist layer 110_1 on the base substrate 100 through a patterning process, such as Figure 3a shown.

[0047] Specifically, the first color photosensitive resin photoresist is coated on the base substrate 100 by the spin coating method, and then exposed using a grayscale mask or a semi-transparent mask, and then developed and baked. , forming the pattern of the first color photoresist layer 110_1 as the first photoresist layer, such as Figure 3a shown.

[0048] (2) forming a second color photosensitive...

Embodiment 2

[0058] When the number of layers of the color photoresist layer in the first preset area is greater than the number of layers of the color photoresist layer in the second preset area, the first preset area includes three layers of color photoresist layers, and the second preset area includes Two layers of color photoresist layers are taken as an example for illustration.

[0059] The manufacturing steps of the color filter substrate include the following steps in addition to steps (1) to (3) in Embodiment 1:

[0060] (4) Forming a third color photosensitive resin photoresist on the base substrate 100 formed with the pattern of the second color photoresist layer 110_2, patterning the third color photosensitive resin photoresist, respectively forming the pattern of the third color photoresist layer 110_3 on the base substrate 100, and forming a pattern of the third color photoresist layer 110_3 on the spacer 120_1 in the first predetermined area Q_1, and In the second preset ar...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for manufacturing a color film substrate, the color film substrate and a relevant device. Due to the fact that at least two layers of color light resistance layers are arranged in a preset area, when images of each color light resistance layer are dried, a spacer can be formed by the color light resistance layers in the preset area. Due to the fact that the height of the spacer formed after hot drying treatment is in positive correlation with the overlapped area of the two adjacent color light resistance layers in the preset area before hot drying treatment, the height of the spacer can be finely adjusted under the condition of not influencing the thickness of the color light resistance layers by controlling the overlapping area between the two adjacent color light resistance layers in the preset area, the chroma of a liquid crystal display panel is not influenced, and the process control difficulty is reduced.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for preparing a color filter substrate, a color filter substrate, a liquid crystal display panel, and a display device. Background technique [0002] Liquid crystal display panel (LCD, Liquid Crystal Display) is generally made of a color filter substrate and an array substrate, and the liquid crystal molecular layer is sandwiched between the color filter substrate and the array substrate. In order to ensure the uniformity of the thickness of the liquid crystal molecular layer, Spacers for support are usually required. [0003] Existing color filter substrates generally include: a red photoresist layer, a green photoresist layer and a blue photoresist layer, a black matrix located between different photoresist layers, and a main spacer and a sub-spacer located on the black matrix ; wherein the height of the main spacer is greater than the height of the secondary spacer....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1335
CPCG02F1/133514G02F1/133516
Inventor 王龙刘园
Owner BOE TECH GRP CO LTD
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com