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Method and monitoring system for monitoring module actuation in exposure machine alignment light source device

A technology of light source device and monitoring system, applied in the direction of comprehensive factory control, electrical program control, comprehensive factory control, etc., can solve the problems of product yield loss, reduce quasi-operational reliability, accumulation of dust on gears, etc., to improve reliability , the effect of improving yield

Active Publication Date: 2019-07-16
POWERCHIP SEMICON MFG CORP
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Problems solved by technology

[0003] Due to the long-term use of the alignment light source system in the exposure machine, the transmission device will produce abnormalities (such as gear wear or accumulated dust), so that the modules in the alignment light source system cannot be in the correct position during work. while directly affecting the amount of light aimed at the light source
As a result, the reliability of the alignment operation will be reduced, resulting in a loss of product yield

Method used

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  • Method and monitoring system for monitoring module actuation in exposure machine alignment light source device
  • Method and monitoring system for monitoring module actuation in exposure machine alignment light source device
  • Method and monitoring system for monitoring module actuation in exposure machine alignment light source device

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Embodiment Construction

[0062] figure 1 It is a flow chart of monitoring the operation of the modules in the alignment light source device of the exposure machine according to an embodiment of the present invention.

[0063] Please refer to figure 1 , firstly, step S100 is performed to provide an alignment light source device, and the alignment light source device includes at least one module. The alignment light source device is, for example, an alignment light source in an exposure machine. The modules include neutral density filter modules, but the invention is not limited thereto.

[0064] Next, step S102 is performed to measure the absolute offset value of the module through a non-contact position measurement method. Non-contact position measurement methods include optical position measurement methods or magnetic position measurement methods. Optical position measurement methods include light interruption measurement methods and light reflection measurement methods.

[0065] The light-inter...

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Abstract

The invention discloses a module operation monitoring method and a monitoring system for aligning an exposure machine with a light source device. The module operation monitoring method includes the following steps. An aiming light source device is provided. The alignment light source device includes at least one module. Measure the absolute offset value of the module through non-contact position measurement. Determine whether the absolute offset value exceeds the allowable range. When the measured absolute offset value exceeds the allowable range, an abnormal signal is generated.

Description

technical field [0001] The invention relates to a monitoring method and a monitoring system for the actuation of a module of a semiconductor manufacturing process machine, and in particular to a method and a monitoring system for monitoring the actuation of a module in an exposure machine alignment light source device. Background technique [0002] In the photolithography process, the formation of patterns on the wafer needs to rely on stable and uniform exposure, and the precise alignment system before exposure has an absolute impact on the formation of patterns. [0003] Due to the long-term use of the alignment light source system in the exposure machine, the transmission device will produce abnormalities (such as gear wear or accumulated dust), so that the modules in the alignment light source system cannot be in the correct position during work. Instead, it directly affects the amount of light aimed at the light source. In this way, the reliability of the alignment ope...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B19/418
CPCY02P90/02
Inventor 杨咏智李启志郑毅
Owner POWERCHIP SEMICON MFG CORP
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