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Large-area optical profilometry device and method based on dual-wavefront interference fringe array

A technology of interference fringe and contour measurement, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of slow measurement speed and achieve the effect of broad application prospects

Active Publication Date: 2019-03-15
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The disadvantage of the line structured light method is that it needs to scan the light strip on the measured object, and the measurement speed is slow

Method used

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  • Large-area optical profilometry device and method based on dual-wavefront interference fringe array
  • Large-area optical profilometry device and method based on dual-wavefront interference fringe array
  • Large-area optical profilometry device and method based on dual-wavefront interference fringe array

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Embodiment Construction

[0032] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0033] Such as figure 1 Shown is a schematic structural diagram of a large-area optical profilometer based on a dual-wavefront interference fringe array of the present invention. The large-area optical profilometry device based on the dual-wavefront interference fringe array of the present invention includes:

[0034] Semiconductor laser 1, used to emit coherent laser light;

[0035] Lens 2, used to receive and convert the coherent laser light emitted by the semiconductor laser;

[0036] The parallel plate group is used to receive and transform the light beam converted by the lens, and project t...

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Abstract

The invention discloses a large-area optical profile measurement device and method based on a double-wavefront interference fringe array; it includes a semiconductor laser, a lens, a parallel flat plate group, a CCD camera and a data processing unit. The invention adopts non-parallel related light sources, projects large-area interference fringes to the object to be measured through an optical system composed of lenses and parallel plate groups, and receives the distorted interference fringe array image modulated by the object to be measured by a CCD camera, and then utilizes the data The processing unit performs image processing, reconstructs the three-dimensional profile of the surface of the object to be measured, and realizes the optical profile measurement of the object to be measured. It has the characteristics of fast, non-contact, high precision, and large area, and has broad application prospects.

Description

technical field [0001] The invention belongs to the technical field of three-dimensional surface shape measurement, and in particular relates to a large-area optical profile measurement device and method based on a double-wavefront interference fringe array. Background technique [0002] With the rapid development of computer, information processing, and optoelectronic technology, optical three-dimensional measurement technology has been widely used. Especially in the fields of industrial manufacturing, product inspection, reverse engineering, biomedicine, film and television special effects, cultural relics protection and other fields, 3D surface shape measurement technology has broad application prospects and research significance. Optical three-dimensional measurement technology is recognized as the most promising method for three-dimensional surface shape measurement because of its fast, non-contact and high precision. [0003] (1) Surface structured light projection ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
CPCG01B11/2441
Inventor 余学才肖景天任华西王晓庞
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA